JPH09283401A5 - - Google Patents

Info

Publication number
JPH09283401A5
JPH09283401A5 JP1996086711A JP8671196A JPH09283401A5 JP H09283401 A5 JPH09283401 A5 JP H09283401A5 JP 1996086711 A JP1996086711 A JP 1996086711A JP 8671196 A JP8671196 A JP 8671196A JP H09283401 A5 JPH09283401 A5 JP H09283401A5
Authority
JP
Japan
Prior art keywords
humidity
exposure apparatus
photosensitive substrate
gas
supplied
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP1996086711A
Other languages
English (en)
Japanese (ja)
Other versions
JPH09283401A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP8086711A priority Critical patent/JPH09283401A/ja
Priority claimed from JP8086711A external-priority patent/JPH09283401A/ja
Priority to KR1019970012127A priority patent/KR100542414B1/ko
Publication of JPH09283401A publication Critical patent/JPH09283401A/ja
Priority to US09/266,873 priority patent/US6535270B1/en
Priority to US10/237,133 priority patent/US20030035087A1/en
Publication of JPH09283401A5 publication Critical patent/JPH09283401A5/ja
Priority to US11/071,106 priority patent/US20050185156A1/en
Withdrawn legal-status Critical Current

Links

JP8086711A 1996-03-27 1996-04-09 露光装置 Withdrawn JPH09283401A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP8086711A JPH09283401A (ja) 1996-04-09 1996-04-09 露光装置
KR1019970012127A KR100542414B1 (ko) 1996-03-27 1997-03-27 노광장치및공조장치
US09/266,873 US6535270B1 (en) 1996-03-27 1999-03-12 Exposure apparatus and air-conditioning apparatus for use with exposure apparatus
US10/237,133 US20030035087A1 (en) 1996-03-27 2002-09-09 Exposure apparatus and air-conditioning apparatus for use with exposure apparatus
US11/071,106 US20050185156A1 (en) 1996-03-27 2005-03-04 Exposure apparatus and air-conditioning apparatus for use with exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8086711A JPH09283401A (ja) 1996-04-09 1996-04-09 露光装置

Publications (2)

Publication Number Publication Date
JPH09283401A JPH09283401A (ja) 1997-10-31
JPH09283401A5 true JPH09283401A5 (enExample) 2004-07-29

Family

ID=13894499

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8086711A Withdrawn JPH09283401A (ja) 1996-03-27 1996-04-09 露光装置

Country Status (1)

Country Link
JP (1) JPH09283401A (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6313953B1 (en) * 1999-01-15 2001-11-06 Donaldson Company, Inc. Gas chemical filtering for optimal light transmittance; and methods
KR100326432B1 (ko) 2000-05-29 2002-02-28 윤종용 웨이퍼 스테이지용 에어 샤워
JP2002158170A (ja) 2000-09-08 2002-05-31 Nikon Corp 露光装置及びデバイス製造方法
US7112549B2 (en) * 2000-09-20 2006-09-26 Sumitomo Metal Industries, Ltd. Low thermal expansion ceramic and member for exposure system
KR101443001B1 (ko) * 2003-09-29 2014-09-22 가부시키가이샤 니콘 투영 노광 장치, 투영 노광 방법 및 디바이스 제조 방법
EP1528430A1 (en) 2003-10-30 2005-05-04 ASML Netherlands B.V. A device manufacturing method, as well as a lithographic apparatus
US7616383B2 (en) 2004-05-18 2009-11-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2009111186A (ja) * 2007-10-30 2009-05-21 Toshiba Corp 基板処理方法、基板搬送方法および基板搬送装置
KR102037749B1 (ko) * 2018-03-16 2019-10-29 에스케이실트론 주식회사 웨이퍼 랩핑 장치

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