JP2005057154A5 - - Google Patents

Download PDF

Info

Publication number
JP2005057154A5
JP2005057154A5 JP2003288438A JP2003288438A JP2005057154A5 JP 2005057154 A5 JP2005057154 A5 JP 2005057154A5 JP 2003288438 A JP2003288438 A JP 2003288438A JP 2003288438 A JP2003288438 A JP 2003288438A JP 2005057154 A5 JP2005057154 A5 JP 2005057154A5
Authority
JP
Japan
Prior art keywords
space
pressure
exposure apparatus
exposure
spaces
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003288438A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005057154A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2003288438A priority Critical patent/JP2005057154A/ja
Priority claimed from JP2003288438A external-priority patent/JP2005057154A/ja
Priority to US10/912,926 priority patent/US7050152B2/en
Publication of JP2005057154A publication Critical patent/JP2005057154A/ja
Publication of JP2005057154A5 publication Critical patent/JP2005057154A5/ja
Pending legal-status Critical Current

Links

JP2003288438A 2003-08-07 2003-08-07 露光装置 Pending JP2005057154A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2003288438A JP2005057154A (ja) 2003-08-07 2003-08-07 露光装置
US10/912,926 US7050152B2 (en) 2003-08-07 2004-08-05 Exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003288438A JP2005057154A (ja) 2003-08-07 2003-08-07 露光装置

Publications (2)

Publication Number Publication Date
JP2005057154A JP2005057154A (ja) 2005-03-03
JP2005057154A5 true JP2005057154A5 (enExample) 2006-09-07

Family

ID=34114044

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003288438A Pending JP2005057154A (ja) 2003-08-07 2003-08-07 露光装置

Country Status (2)

Country Link
US (1) US7050152B2 (enExample)
JP (1) JP2005057154A (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005129898A (ja) * 2003-09-29 2005-05-19 Canon Inc 露光装置およびデバイス製造方法
US20050223973A1 (en) * 2004-03-30 2005-10-13 Infineon Technologies Ag EUV lithography system and chuck for releasing reticle in a vacuum isolated environment
JP4378357B2 (ja) 2006-03-14 2009-12-02 キヤノン株式会社 露光装置及びその圧力制御方法並びにデバイス製造方法
GB0611648D0 (en) * 2006-06-13 2006-07-19 Boc Group Plc Method of controlling contamination of a surface
DE102006044591A1 (de) * 2006-09-19 2008-04-03 Carl Zeiss Smt Ag Optische Anordnung, insbesondere Projektionsbelichtungsanlage für die EUV-Lithographie, sowie reflektives optisches Element mit verminderter Kontamination
DE102006050835A1 (de) * 2006-10-27 2008-05-08 Carl Zeiss Smt Ag Verfahren und Vorrichtung zum Austausch von Objetkivteilen
EP2684871B1 (en) * 2006-12-19 2016-05-04 F. Hoffmann-La Roche AG Heteroaryl pyrrolidinyl and piperidinyl ketone derivatives
EP2191331B1 (en) * 2007-09-21 2017-05-31 Carl Zeiss SMT GmbH Projection objective with obscurated pupil for microlithography
JP5902884B2 (ja) * 2007-10-26 2016-04-13 カール・ツァイス・エスエムティー・ゲーエムベーハー 結像光学系及びこの種の結像光学系を含むマイクロリソグラフィ用の投影露光装置
DE102007051671A1 (de) 2007-10-26 2009-05-07 Carl Zeiss Smt Ag Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik
CN102819197B (zh) 2007-10-26 2016-06-22 卡尔蔡司Smt有限责任公司 成像光学系统、投射曝光设备、微结构部件及其产生方法
KR20140097574A (ko) * 2007-11-06 2014-08-06 칼 짜이스 에스엠티 게엠베하 광학면으로부터 오염층을 제거하는 방법, 세정 가스를 생성하는 방법 및 대응하는 세정 및 세정 가스 생성 장치들
US20090141257A1 (en) * 2007-11-27 2009-06-04 Nikon Corporation Illumination optical apparatus, exposure apparatus, and method for producing device
NL1036957A1 (nl) * 2008-06-13 2009-12-15 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
DE102009029282A1 (de) * 2009-09-08 2011-03-24 Carl Zeiss Smt Gmbh Optische Anordnung, insbesondere in einer Projektionsbelichtungsanlage für die EUV-Lithographie
NL2005741A (en) * 2009-12-23 2011-06-27 Asml Netherlands Bv Lithographic apparatus and method.
US8587768B2 (en) * 2010-04-05 2013-11-19 Media Lario S.R.L. EUV collector system with enhanced EUV radiation collection
DE102016210698A1 (de) * 2016-06-15 2017-12-21 Carl Zeiss Smt Gmbh Optische Anordnung und Verfahren zum Betreiben der optischen Anordnung
NL2025089A (en) * 2019-04-01 2020-10-06 Asml Netherlands Bv A lithographic apparatus and related methods
US12158706B2 (en) 2019-07-09 2024-12-03 Asml Netherlands B.V. Lithographic apparatus and method with improved contaminant particle capture

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2691865B2 (ja) 1994-03-18 1997-12-17 株式会社ソルテック 極紫外線縮小投影露光装置
US6198792B1 (en) * 1998-11-06 2001-03-06 Euv Llc Wafer chamber having a gas curtain for extreme-UV lithography
US6333775B1 (en) * 1999-01-13 2001-12-25 Euv Llc Extreme-UV lithography vacuum chamber zone seal
AU2327800A (en) * 1999-02-12 2000-08-29 Nikon Corporation Exposure method and apparatus
WO2000055891A1 (en) * 1999-03-12 2000-09-21 Nikon Corporation Exposure device, exposure method, and device manufacturing method
US6791661B2 (en) * 1999-12-09 2004-09-14 Nikon Corporation Gas replacement method and apparatus, and exposure method and apparatus

Similar Documents

Publication Publication Date Title
JP2005057154A5 (enExample)
US6753941B2 (en) Lithographic apparatus and device manufacturing method
KR101714563B1 (ko) 광자 소스, 메트롤로지 장치, 리소그래피 시스템 및 디바이스 제조 방법
US6411368B1 (en) Projection exposure method, projection exposure apparatus, and methods of manufacturing and optically cleaning the exposure apparatus
JP4777381B2 (ja) ペリクルおよびリソグラフィ装置
EP1331519A3 (en) Exposure control
JP2005101537A5 (enExample)
US7106412B2 (en) Lithographic apparatus comprising a gas flushing system
TW200731335A (en) Exposure apparatus and device manufacturing method
JP2008268888A (ja) 露光描画装置
JP2009147346A (ja) 露光装置、露光方法及びデバイス製造方法
US6819398B2 (en) Exposure apparatus and control method therefor, and semiconductor device manufacturing method
JP2007250686A5 (enExample)
JP2009182339A (ja) リソグラフィ装置、レチクル交換ユニットおよびデバイス製造方法
JP2009088358A5 (enExample)
EP1004937A3 (en) Exposure apparatus and optical system therefor
JP4966410B2 (ja) リソグラフィ装置およびデバイス製造方法
EP1698940A3 (en) Exposure method and apparatus
TWI311691B (en) Lithographic apparatus and device manufacturing method
WO2004038458A3 (en) Apparatus for producing approximately collimated light and method of curing a photopolymerisable layer using the apparatus
TW440918B (en) Exposure apparatus and optical system therefor
JP2005093692A5 (enExample)
TW202141201A (zh) 導管系統、輻射源、微影裝置及其方法
TWI794710B (zh) 具有獨立之電壓及時序控制及減少之電力消耗之雙脈衝電力系統
JP4331099B2 (ja) リソグラフィ装置およびデバイス製造方法