JP2007250686A5 - - Google Patents

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Publication number
JP2007250686A5
JP2007250686A5 JP2006069901A JP2006069901A JP2007250686A5 JP 2007250686 A5 JP2007250686 A5 JP 2007250686A5 JP 2006069901 A JP2006069901 A JP 2006069901A JP 2006069901 A JP2006069901 A JP 2006069901A JP 2007250686 A5 JP2007250686 A5 JP 2007250686A5
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JP
Japan
Prior art keywords
pressure
space
exposure apparatus
optical system
regulator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006069901A
Other languages
English (en)
Japanese (ja)
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JP2007250686A (ja
JP4378357B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2006069901A priority Critical patent/JP4378357B2/ja
Priority claimed from JP2006069901A external-priority patent/JP4378357B2/ja
Priority to US11/684,953 priority patent/US7525106B2/en
Priority to TW096108630A priority patent/TW200745774A/zh
Priority to KR1020070024881A priority patent/KR100880617B1/ko
Publication of JP2007250686A publication Critical patent/JP2007250686A/ja
Publication of JP2007250686A5 publication Critical patent/JP2007250686A5/ja
Application granted granted Critical
Publication of JP4378357B2 publication Critical patent/JP4378357B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2006069901A 2006-03-14 2006-03-14 露光装置及びその圧力制御方法並びにデバイス製造方法 Expired - Fee Related JP4378357B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006069901A JP4378357B2 (ja) 2006-03-14 2006-03-14 露光装置及びその圧力制御方法並びにデバイス製造方法
US11/684,953 US7525106B2 (en) 2006-03-14 2007-03-12 Exposure apparatus, pressure control method for the same, and device manufacturing method
TW096108630A TW200745774A (en) 2006-03-14 2007-03-13 Exposure apparatus, pressure control method for the same, and device manufacturing method
KR1020070024881A KR100880617B1 (ko) 2006-03-14 2007-03-14 노광장치, 그 압력제어방법, 및 디바이스 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006069901A JP4378357B2 (ja) 2006-03-14 2006-03-14 露光装置及びその圧力制御方法並びにデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2007250686A JP2007250686A (ja) 2007-09-27
JP2007250686A5 true JP2007250686A5 (enExample) 2007-11-29
JP4378357B2 JP4378357B2 (ja) 2009-12-02

Family

ID=38594682

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006069901A Expired - Fee Related JP4378357B2 (ja) 2006-03-14 2006-03-14 露光装置及びその圧力制御方法並びにデバイス製造方法

Country Status (4)

Country Link
US (1) US7525106B2 (enExample)
JP (1) JP4378357B2 (enExample)
KR (1) KR100880617B1 (enExample)
TW (1) TW200745774A (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006044591A1 (de) * 2006-09-19 2008-04-03 Carl Zeiss Smt Ag Optische Anordnung, insbesondere Projektionsbelichtungsanlage für die EUV-Lithographie, sowie reflektives optisches Element mit verminderter Kontamination
JP4656115B2 (ja) 2007-09-27 2011-03-23 ソニー株式会社 撮像装置、画像信号処理回路、および画像信号処理方法、並びにコンピュータ・プログラム
JP2009294439A (ja) * 2008-06-05 2009-12-17 Toshiba Corp レジストパターン形成方法
NL2005741A (en) * 2009-12-23 2011-06-27 Asml Netherlands Bv Lithographic apparatus and method.
JP2012114140A (ja) * 2010-11-22 2012-06-14 Renesas Electronics Corp 露光方法および露光装置
NL2008186A (en) * 2011-03-14 2012-09-17 Asml Netherlands Bv Projection system, lithographic apparatus and device manufacturing method.
US9506478B2 (en) * 2012-01-13 2016-11-29 Edwards Limited Vacuum system
JP2015127837A (ja) * 2015-04-03 2015-07-09 ルネサスエレクトロニクス株式会社 露光方法および露光装置
JP6748461B2 (ja) * 2016-03-22 2020-09-02 キヤノン株式会社 インプリント装置、インプリント装置の動作方法および物品製造方法
US11979971B2 (en) * 2018-06-29 2024-05-07 Taiwan Semiconductor Manufacturing Company, Ltd. EUV light source and apparatus for lithography
NL2025089A (en) * 2019-04-01 2020-10-06 Asml Netherlands Bv A lithographic apparatus and related methods
US11150564B1 (en) 2020-09-29 2021-10-19 Taiwan Semiconductor Manufacturing Co., Ltd. EUV wafer defect improvement and method of collecting nonconductive particles

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010023314A (ko) 1997-08-26 2001-03-26 오노 시게오 노광 장치, 노광 방법, 투영 광학계의 압력 조정 방법 및노광 장치의 조립 방법
EP1273907A4 (en) * 2000-11-17 2006-08-30 Ebara Corp METHOD AND INSTRUMENT FOR WAFER INSPECTION AND ELECTRON BEAM
WO2002045153A1 (fr) * 2000-12-01 2002-06-06 Ebara Corporation Procede et appareil d'inspection utilisant un faisceau d'electrons, et procede de production de dispositif utilisant celui-ci
CN1495528B (zh) 2002-08-15 2011-10-12 Asml荷兰有限公司 光刻投射装置及用于所述装置中的反射器组件
JP2005057154A (ja) 2003-08-07 2005-03-03 Canon Inc 露光装置

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