JPH09283401A - 露光装置 - Google Patents

露光装置

Info

Publication number
JPH09283401A
JPH09283401A JP8086711A JP8671196A JPH09283401A JP H09283401 A JPH09283401 A JP H09283401A JP 8086711 A JP8086711 A JP 8086711A JP 8671196 A JP8671196 A JP 8671196A JP H09283401 A JPH09283401 A JP H09283401A
Authority
JP
Japan
Prior art keywords
humidity
gas
wafer
atmosphere
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP8086711A
Other languages
English (en)
Japanese (ja)
Other versions
JPH09283401A5 (enExample
Inventor
Masayuki Murayama
正幸 村山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP8086711A priority Critical patent/JPH09283401A/ja
Priority to KR1019970012127A priority patent/KR100542414B1/ko
Publication of JPH09283401A publication Critical patent/JPH09283401A/ja
Priority to US09/266,873 priority patent/US6535270B1/en
Priority to US10/237,133 priority patent/US20030035087A1/en
Publication of JPH09283401A5 publication Critical patent/JPH09283401A5/ja
Priority to US11/071,106 priority patent/US20050185156A1/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP8086711A 1996-03-27 1996-04-09 露光装置 Withdrawn JPH09283401A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP8086711A JPH09283401A (ja) 1996-04-09 1996-04-09 露光装置
KR1019970012127A KR100542414B1 (ko) 1996-03-27 1997-03-27 노광장치및공조장치
US09/266,873 US6535270B1 (en) 1996-03-27 1999-03-12 Exposure apparatus and air-conditioning apparatus for use with exposure apparatus
US10/237,133 US20030035087A1 (en) 1996-03-27 2002-09-09 Exposure apparatus and air-conditioning apparatus for use with exposure apparatus
US11/071,106 US20050185156A1 (en) 1996-03-27 2005-03-04 Exposure apparatus and air-conditioning apparatus for use with exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8086711A JPH09283401A (ja) 1996-04-09 1996-04-09 露光装置

Publications (2)

Publication Number Publication Date
JPH09283401A true JPH09283401A (ja) 1997-10-31
JPH09283401A5 JPH09283401A5 (enExample) 2004-07-29

Family

ID=13894499

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8086711A Withdrawn JPH09283401A (ja) 1996-03-27 1996-04-09 露光装置

Country Status (1)

Country Link
JP (1) JPH09283401A (enExample)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002024600A1 (en) * 2000-09-20 2002-03-28 Sumitomo Metal Industries, Ltd. Low thermal expansion ceramic and member for exposure system
JP2002535703A (ja) * 1999-01-15 2002-10-22 ドナルドソン カンパニー，インコーポレイティド 気体の光透過率を最適化するための化学的フィルタリング
US6522385B2 (en) 2000-05-29 2003-02-18 Samsung Electronics Co., Ltd. Air shower head of photolithography equipment for directing air towards a wafer stage
US6762820B2 (en) 2000-09-08 2004-07-13 Nikon Corporation Exposure apparatus and device manufacturing method
JP2005333134A (ja) * 2004-05-18 2005-12-02 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
US7075617B2 (en) 2003-10-30 2006-07-11 Asml Netherlands B.V. Device manufacturing method and a lithographic apparatus
JP2009111186A (ja) * 2007-10-30 2009-05-21 Toshiba Corp 基板処理方法、基板搬送方法および基板搬送装置
KR101319108B1 (ko) * 2003-09-29 2013-10-17 가부시키가이샤 니콘 투영 노광 장치, 투영 노광 방법 및 디바이스 제조 방법
KR20190108913A (ko) * 2018-03-16 2019-09-25 에스케이실트론 주식회사 웨이퍼 랩핑 장치

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002535703A (ja) * 1999-01-15 2002-10-22 ドナルドソン カンパニー，インコーポレイティド 気体の光透過率を最適化するための化学的フィルタリング
US6522385B2 (en) 2000-05-29 2003-02-18 Samsung Electronics Co., Ltd. Air shower head of photolithography equipment for directing air towards a wafer stage
US6762820B2 (en) 2000-09-08 2004-07-13 Nikon Corporation Exposure apparatus and device manufacturing method
US7112549B2 (en) * 2000-09-20 2006-09-26 Sumitomo Metal Industries, Ltd. Low thermal expansion ceramic and member for exposure system
WO2002024600A1 (en) * 2000-09-20 2002-03-28 Sumitomo Metal Industries, Ltd. Low thermal expansion ceramic and member for exposure system
KR101319108B1 (ko) * 2003-09-29 2013-10-17 가부시키가이샤 니콘 투영 노광 장치, 투영 노광 방법 및 디바이스 제조 방법
US8797502B2 (en) 2003-09-29 2014-08-05 Nikon Corporation Exposure apparatus, exposure method, and method for producing device with electricity removal device by adding additive to liquid
US7075617B2 (en) 2003-10-30 2006-07-11 Asml Netherlands B.V. Device manufacturing method and a lithographic apparatus
JP2005333134A (ja) * 2004-05-18 2005-12-02 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
US7616383B2 (en) 2004-05-18 2009-11-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9623436B2 (en) 2004-05-18 2017-04-18 Asml Netherlands B.V. Active drying station and method to remove immersion liquid using gas flow supply with gas outlet between two gas inlets
US10761438B2 (en) 2004-05-18 2020-09-01 Asml Netherlands B.V. Active drying station and method to remove immersion liquid using gas flow supply with gas outlet between two gas inlets
JP2009111186A (ja) * 2007-10-30 2009-05-21 Toshiba Corp 基板処理方法、基板搬送方法および基板搬送装置
KR20190108913A (ko) * 2018-03-16 2019-09-25 에스케이실트론 주식회사 웨이퍼 랩핑 장치

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Legal Events

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A977 Report on retrieval

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Effective date: 20041130

A761 Written withdrawal of application

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Effective date: 20060920