JPH10256243A5 - - Google Patents

Info

Publication number
JPH10256243A5
JPH10256243A5 JP1997062996A JP6299697A JPH10256243A5 JP H10256243 A5 JPH10256243 A5 JP H10256243A5 JP 1997062996 A JP1997062996 A JP 1997062996A JP 6299697 A JP6299697 A JP 6299697A JP H10256243 A5 JPH10256243 A5 JP H10256243A5
Authority
JP
Japan
Prior art keywords
high frequency
layer film
heating device
substrate
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1997062996A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10256243A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP9062996A priority Critical patent/JPH10256243A/ja
Priority claimed from JP9062996A external-priority patent/JPH10256243A/ja
Publication of JPH10256243A publication Critical patent/JPH10256243A/ja
Publication of JPH10256243A5 publication Critical patent/JPH10256243A5/ja
Pending legal-status Critical Current

Links

JP9062996A 1997-03-17 1997-03-17 薄膜、薄膜形成方法及び装置 Pending JPH10256243A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9062996A JPH10256243A (ja) 1997-03-17 1997-03-17 薄膜、薄膜形成方法及び装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9062996A JPH10256243A (ja) 1997-03-17 1997-03-17 薄膜、薄膜形成方法及び装置

Publications (2)

Publication Number Publication Date
JPH10256243A JPH10256243A (ja) 1998-09-25
JPH10256243A5 true JPH10256243A5 (https=) 2005-02-17

Family

ID=13216505

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9062996A Pending JPH10256243A (ja) 1997-03-17 1997-03-17 薄膜、薄膜形成方法及び装置

Country Status (1)

Country Link
JP (1) JPH10256243A (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015151151A1 (ja) * 2014-03-31 2015-10-08 Ｓｐｐテクノロジーズ株式会社 加熱装置、及びこれを備えたプラズマ処理装置
JP6787813B2 (ja) * 2017-02-16 2020-11-18 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 半導体装置の製造方法、基板処理装置およびプログラム

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