JPH10152223A - 搬送装置 - Google Patents

搬送装置

Info

Publication number
JPH10152223A
JPH10152223A JP8311519A JP31151996A JPH10152223A JP H10152223 A JPH10152223 A JP H10152223A JP 8311519 A JP8311519 A JP 8311519A JP 31151996 A JP31151996 A JP 31151996A JP H10152223 A JPH10152223 A JP H10152223A
Authority
JP
Japan
Prior art keywords
chamber
exhaust
reticle
dust
storage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP8311519A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10152223A5 (enExample
Inventor
Shinichi Hirakawa
伸一 平川
Kanefumi Nakahara
兼文 中原
Yutaka Endo
豊 遠藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP8311519A priority Critical patent/JPH10152223A/ja
Publication of JPH10152223A publication Critical patent/JPH10152223A/ja
Publication of JPH10152223A5 publication Critical patent/JPH10152223A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70733Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075Handling workpieces outside exposure position, e.g. SMIF box

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP8311519A 1996-11-22 1996-11-22 搬送装置 Withdrawn JPH10152223A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8311519A JPH10152223A (ja) 1996-11-22 1996-11-22 搬送装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8311519A JPH10152223A (ja) 1996-11-22 1996-11-22 搬送装置

Publications (2)

Publication Number Publication Date
JPH10152223A true JPH10152223A (ja) 1998-06-09
JPH10152223A5 JPH10152223A5 (enExample) 2005-09-29

Family

ID=18018224

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8311519A Withdrawn JPH10152223A (ja) 1996-11-22 1996-11-22 搬送装置

Country Status (1)

Country Link
JP (1) JPH10152223A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101283312B1 (ko) * 2011-12-29 2013-07-09 로체 시스템즈(주) Fosb 오토 로딩 시스템

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101283312B1 (ko) * 2011-12-29 2013-07-09 로체 시스템즈(주) Fosb 오토 로딩 시스템

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Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050513

A761 Written withdrawal of application

Free format text: JAPANESE INTERMEDIATE CODE: A761

Effective date: 20061003