JPH10152223A - 搬送装置 - Google Patents
搬送装置Info
- Publication number
- JPH10152223A JPH10152223A JP8311519A JP31151996A JPH10152223A JP H10152223 A JPH10152223 A JP H10152223A JP 8311519 A JP8311519 A JP 8311519A JP 31151996 A JP31151996 A JP 31151996A JP H10152223 A JPH10152223 A JP H10152223A
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- exhaust
- reticle
- dust
- storage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8311519A JPH10152223A (ja) | 1996-11-22 | 1996-11-22 | 搬送装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8311519A JPH10152223A (ja) | 1996-11-22 | 1996-11-22 | 搬送装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10152223A true JPH10152223A (ja) | 1998-06-09 |
| JPH10152223A5 JPH10152223A5 (enExample) | 2005-09-29 |
Family
ID=18018224
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8311519A Withdrawn JPH10152223A (ja) | 1996-11-22 | 1996-11-22 | 搬送装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH10152223A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101283312B1 (ko) * | 2011-12-29 | 2013-07-09 | 로체 시스템즈(주) | Fosb 오토 로딩 시스템 |
-
1996
- 1996-11-22 JP JP8311519A patent/JPH10152223A/ja not_active Withdrawn
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101283312B1 (ko) * | 2011-12-29 | 2013-07-09 | 로체 시스템즈(주) | Fosb 오토 로딩 시스템 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7793609B2 (en) | Coating and developing apparatus | |
| CN100535751C (zh) | 涂布、显像装置和涂布、显像方法 | |
| JP5398595B2 (ja) | 基板収納装置 | |
| TW384505B (en) | Coating device | |
| JP2002280296A (ja) | 液処理装置 | |
| JP4343069B2 (ja) | 塗布、現像装置、露光装置及びレジストパターン形成方法。 | |
| KR20080104986A (ko) | 도포·현상 장치 및 도포·현상 장치의 운전 방법 및 기억매체 | |
| JP2001015578A (ja) | 基板処理装置 | |
| US20080196658A1 (en) | Substrate processing apparatus including a substrate reversing region | |
| JP2020205299A (ja) | ウエハ搬送装置 | |
| JPH10152223A (ja) | 搬送装置 | |
| JP4062437B2 (ja) | 基板洗浄装置および基板処理施設 | |
| JP4790326B2 (ja) | 処理システム及び処理方法 | |
| JP4748683B2 (ja) | 液処理装置 | |
| JP7316102B2 (ja) | ウエハ搬送装置 | |
| KR102534203B1 (ko) | 기판 처리 시스템 | |
| JP3811359B2 (ja) | 液処理装置 | |
| JP3521388B2 (ja) | 基板搬送装置及び処理システム | |
| JP4322411B2 (ja) | 半導体製造装置 | |
| JP2011047972A (ja) | 露光装置、及びそれを用いたデバイスの製造方法 | |
| JP4748263B2 (ja) | 塗布、現像装置 | |
| KR20240107746A (ko) | 대기 포트 및 이를 가지는 기판 처리 장치 | |
| JPH11204427A (ja) | 処理装置 | |
| JP2000091399A (ja) | 半導体製造装置 | |
| JPH0888263A (ja) | 基板供給装置およびこれを用いた露光装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20050513 |
|
| A761 | Written withdrawal of application |
Free format text: JAPANESE INTERMEDIATE CODE: A761 Effective date: 20061003 |