JPH10135175A5 - - Google Patents

Info

Publication number
JPH10135175A5
JPH10135175A5 JP1996289462A JP28946296A JPH10135175A5 JP H10135175 A5 JPH10135175 A5 JP H10135175A5 JP 1996289462 A JP1996289462 A JP 1996289462A JP 28946296 A JP28946296 A JP 28946296A JP H10135175 A5 JPH10135175 A5 JP H10135175A5
Authority
JP
Japan
Prior art keywords
cleaning
tank
wafer
liquid
cleaning tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1996289462A
Other languages
English (en)
Japanese (ja)
Other versions
JP3898257B2 (ja
JPH10135175A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP28946296A priority Critical patent/JP3898257B2/ja
Priority claimed from JP28946296A external-priority patent/JP3898257B2/ja
Publication of JPH10135175A publication Critical patent/JPH10135175A/ja
Publication of JPH10135175A5 publication Critical patent/JPH10135175A5/ja
Application granted granted Critical
Publication of JP3898257B2 publication Critical patent/JP3898257B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP28946296A 1996-10-31 1996-10-31 ウエハ洗浄装置及びウエハ洗浄方法 Expired - Fee Related JP3898257B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28946296A JP3898257B2 (ja) 1996-10-31 1996-10-31 ウエハ洗浄装置及びウエハ洗浄方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28946296A JP3898257B2 (ja) 1996-10-31 1996-10-31 ウエハ洗浄装置及びウエハ洗浄方法

Publications (3)

Publication Number Publication Date
JPH10135175A JPH10135175A (ja) 1998-05-22
JPH10135175A5 true JPH10135175A5 (enrdf_load_stackoverflow) 2004-10-21
JP3898257B2 JP3898257B2 (ja) 2007-03-28

Family

ID=17743590

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28946296A Expired - Fee Related JP3898257B2 (ja) 1996-10-31 1996-10-31 ウエハ洗浄装置及びウエハ洗浄方法

Country Status (1)

Country Link
JP (1) JP3898257B2 (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20040041763A (ko) * 2002-11-11 2004-05-20 삼성전자주식회사 반도체 웨이퍼 세정시스템 및 그 방법
JP2008093529A (ja) * 2006-10-10 2008-04-24 Nidec Sankyo Corp 洗浄装置及び洗浄方法
KR100821831B1 (ko) * 2006-11-22 2008-04-14 동부일렉트로닉스 주식회사 웨이퍼 가이드 버블 제거 시스템를 갖춘 케미칼 순환 장치
CN101620982B (zh) 2008-07-02 2011-07-06 中芯国际集成电路制造(北京)有限公司 晶圆清洗方法和清洗装置
JP2010225832A (ja) * 2009-03-24 2010-10-07 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法
JP6494536B2 (ja) * 2016-01-12 2019-04-03 東京エレクトロン株式会社 基板処理装置および基板処理装置の洗浄方法
CN112349629B (zh) * 2020-10-30 2023-12-22 北京北方华创微电子装备有限公司 清洗槽组件和半导体清洗设备

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