JPH10116886A5 - - Google Patents

Info

Publication number
JPH10116886A5
JPH10116886A5 JP1996289305A JP28930596A JPH10116886A5 JP H10116886 A5 JPH10116886 A5 JP H10116886A5 JP 1996289305 A JP1996289305 A JP 1996289305A JP 28930596 A JP28930596 A JP 28930596A JP H10116886 A5 JPH10116886 A5 JP H10116886A5
Authority
JP
Japan
Prior art keywords
mask
sample
stage
holding
holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1996289305A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10116886A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP28930596A priority Critical patent/JPH10116886A/ja
Priority claimed from JP28930596A external-priority patent/JPH10116886A/ja
Publication of JPH10116886A publication Critical patent/JPH10116886A/ja
Priority to US10/429,868 priority patent/US6888621B2/en
Publication of JPH10116886A5 publication Critical patent/JPH10116886A5/ja
Pending legal-status Critical Current

Links

JP28930596A 1996-03-22 1996-10-11 試料保持方法及び露光装置 Pending JPH10116886A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP28930596A JPH10116886A (ja) 1996-10-11 1996-10-11 試料保持方法及び露光装置
US10/429,868 US6888621B2 (en) 1996-03-22 2003-05-06 Mask-holding apparatus for a light exposure apparatus and related scanning-exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28930596A JPH10116886A (ja) 1996-10-11 1996-10-11 試料保持方法及び露光装置

Publications (2)

Publication Number Publication Date
JPH10116886A JPH10116886A (ja) 1998-05-06
JPH10116886A5 true JPH10116886A5 (enExample) 2004-10-14

Family

ID=17741468

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28930596A Pending JPH10116886A (ja) 1996-03-22 1996-10-11 試料保持方法及び露光装置

Country Status (1)

Country Link
JP (1) JPH10116886A (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000065645A1 (en) * 1999-04-27 2000-11-02 Nikon Corporation Stage device and exposure device
KR20010057347A (ko) * 1999-12-22 2001-07-04 황인길 스텝퍼에 사용되는 레티클의 정전기 방지구조
JP4640876B2 (ja) * 2000-06-13 2011-03-02 株式会社アルバック 基板搬送装置
US7351503B2 (en) 2001-01-22 2008-04-01 Photronics, Inc. Fused silica pellicle in intimate contact with the surface of a photomask
KR100530499B1 (ko) * 2003-12-26 2005-11-22 삼성전자주식회사 노광 방법 및 이를 수행하기 위한 레티클, 레티클어셈블리 및노광 장치
JP4753625B2 (ja) * 2005-05-31 2011-08-24 大日本スクリーン製造株式会社 パターン描画装置およびブロック数決定方法
JP4953185B2 (ja) * 2005-06-07 2012-06-13 株式会社リコー 電子写真用感光体劣化加速試験方法及び加速試験装置
US7459701B2 (en) * 2005-06-08 2008-12-02 Asml Netherlands B.V. Stage apparatus, lithographic apparatus and device manufacturing method
US7372549B2 (en) * 2005-06-24 2008-05-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8264670B2 (en) * 2006-01-31 2012-09-11 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method for clamping a patterning device
US7733463B2 (en) * 2006-05-05 2010-06-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2008016510A (ja) * 2006-07-03 2008-01-24 Nuflare Technology Inc 半導体回路パターン形成装置
CN103092007B (zh) * 2013-02-06 2015-06-17 京东方科技集团股份有限公司 曝光机掩膜版安装装置
JP6390310B2 (ja) * 2013-09-27 2018-09-19 Toto株式会社 露光装置部材支持体
JP6589419B2 (ja) * 2015-07-09 2019-10-16 株式会社デンソー 基板加工装置および基板加工方法

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