JPH09270385A - 露光装置の環境制御装置 - Google Patents

露光装置の環境制御装置

Info

Publication number
JPH09270385A
JPH09270385A JP8104406A JP10440696A JPH09270385A JP H09270385 A JPH09270385 A JP H09270385A JP 8104406 A JP8104406 A JP 8104406A JP 10440696 A JP10440696 A JP 10440696A JP H09270385 A JPH09270385 A JP H09270385A
Authority
JP
Japan
Prior art keywords
filter
exposure
ozone
light
control device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8104406A
Other languages
English (en)
Japanese (ja)
Other versions
JPH09270385A5 (enExample
Inventor
Toshiji Nakajima
利治 中島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP8104406A priority Critical patent/JPH09270385A/ja
Priority to US08/825,398 priority patent/US6208406B1/en
Publication of JPH09270385A publication Critical patent/JPH09270385A/ja
Priority to US09/989,176 priority patent/US6710846B2/en
Publication of JPH09270385A5 publication Critical patent/JPH09270385A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP8104406A 1996-03-29 1996-03-29 露光装置の環境制御装置 Pending JPH09270385A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP8104406A JPH09270385A (ja) 1996-03-29 1996-03-29 露光装置の環境制御装置
US08/825,398 US6208406B1 (en) 1996-03-29 1997-03-28 Environmental control apparatus for exposure apparatus
US09/989,176 US6710846B2 (en) 1996-03-29 2001-11-21 Environmental control apparatus for exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8104406A JPH09270385A (ja) 1996-03-29 1996-03-29 露光装置の環境制御装置

Publications (2)

Publication Number Publication Date
JPH09270385A true JPH09270385A (ja) 1997-10-14
JPH09270385A5 JPH09270385A5 (enExample) 2004-07-15

Family

ID=14379841

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8104406A Pending JPH09270385A (ja) 1996-03-29 1996-03-29 露光装置の環境制御装置

Country Status (2)

Country Link
US (2) US6208406B1 (enExample)
JP (1) JPH09270385A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000022656A1 (fr) * 1998-10-13 2000-04-20 Nikon Corporation Systeme d'exposition
WO2012131944A1 (ja) * 2011-03-30 2012-10-04 富士通株式会社 大気環境測定装置、大気環境測定方法及び大気環境測定システム

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11204411A (ja) * 1998-01-19 1999-07-30 Nikon Corp 塗布現像露光装置
JPH11274050A (ja) * 1998-03-25 1999-10-08 Canon Inc 露光装置およびデバイス製造方法
JP3517583B2 (ja) * 1998-03-27 2004-04-12 キヤノン株式会社 露光装置、デバイス製造方法及び放電灯
KR20010112265A (ko) 1999-02-12 2001-12-20 시마무라 테루오 노광방법 및 장치
KR20020036952A (ko) * 1999-05-27 2002-05-17 시마무라 테루오 노광장치 및 디바이스 제조방법, 그리고 노광장치의환경제어방법
EP1229573A4 (en) 1999-07-16 2006-11-08 Nikon Corp EXPOSURE METHOD AND SYSTEM
US6654095B1 (en) 1999-10-18 2003-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
JP2001118783A (ja) 1999-10-21 2001-04-27 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
TW480372B (en) * 1999-11-05 2002-03-21 Asm Lithography Bv Lithographic projection apparatus, method of manufacturing a device using the apparatus, and device manufactured according to the method
JP2001345263A (ja) * 2000-03-31 2001-12-14 Nikon Corp 露光装置及び露光方法、並びにデバイス製造方法
JP2002158170A (ja) 2000-09-08 2002-05-31 Nikon Corp 露光装置及びデバイス製造方法
DE10131918A1 (de) * 2001-07-02 2003-01-16 Zeiss Carl Sensor zur Strahlungsenergiebestimmung und Verwendung hierfür
JP2004356356A (ja) * 2003-05-29 2004-12-16 Oki Electric Ind Co Ltd 洗浄終了判定方法および洗浄装置
JP5305568B2 (ja) * 2006-05-22 2013-10-02 株式会社東芝 露光装置及びケミカルフィルタ寿命検知方法
CN107359136B (zh) * 2017-08-09 2018-10-02 睿力集成电路有限公司 隔离沟槽的填充方法、设备及隔离沟槽的填充结构

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03146971A (ja) * 1989-11-02 1991-06-21 Ricoh Co Ltd 画像形成装置
US4989031A (en) * 1990-01-29 1991-01-29 Nikon Corporation Projection exposure apparatus
US5430303A (en) * 1992-07-01 1995-07-04 Nikon Corporation Exposure apparatus
US5559584A (en) 1993-03-08 1996-09-24 Nikon Corporation Exposure apparatus
US5696623A (en) 1993-08-05 1997-12-09 Fujitsu Limited UV exposure with elongated service lifetime
JP3500619B2 (ja) 1993-10-28 2004-02-23 株式会社ニコン 投影露光装置
JP3387075B2 (ja) * 1994-12-12 2003-03-17 株式会社ニコン 走査露光方法、露光装置、及び走査型露光装置
KR0149778B1 (ko) * 1995-08-18 1998-12-01 김광호 화상형성장치의 오존방출팬 구동 제어방법
JP3624973B2 (ja) * 1995-10-12 2005-03-02 株式会社ニコン 投影光学系

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000022656A1 (fr) * 1998-10-13 2000-04-20 Nikon Corporation Systeme d'exposition
WO2012131944A1 (ja) * 2011-03-30 2012-10-04 富士通株式会社 大気環境測定装置、大気環境測定方法及び大気環境測定システム
JPWO2012131944A1 (ja) * 2011-03-30 2014-07-24 富士通株式会社 大気環境測定装置、大気環境測定方法及び大気環境測定システム
US9395334B2 (en) 2011-03-30 2016-07-19 Fujitsu Limited Atmospheric environment measuring apparatus, atmospheric environment measuring method and atmospheric environment measuring system

Also Published As

Publication number Publication date
US6208406B1 (en) 2001-03-27
US6710846B2 (en) 2004-03-23
US20020048004A1 (en) 2002-04-25

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