WO2000022656A1 - Systeme d'exposition - Google Patents

Systeme d'exposition Download PDF

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Publication number
WO2000022656A1
WO2000022656A1 PCT/JP1999/005633 JP9905633W WO0022656A1 WO 2000022656 A1 WO2000022656 A1 WO 2000022656A1 JP 9905633 W JP9905633 W JP 9905633W WO 0022656 A1 WO0022656 A1 WO 0022656A1
Authority
WO
WIPO (PCT)
Prior art keywords
gas
illumination light
exposure apparatus
optical system
helium
Prior art date
Application number
PCT/JP1999/005633
Other languages
English (en)
Japanese (ja)
Inventor
Osamu Yamashita
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Priority to AU61218/99A priority Critical patent/AU6121899A/en
Publication of WO2000022656A1 publication Critical patent/WO2000022656A1/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements

Abstract

L'invention concerne un système d'exposition doté d'un système optique d'illumination destiné à appliquer une lumière d'illumination (IL) provenant d'une source de lumière (1) à un réticule (R), lequel expose une plaquette (W) en tant que substance photosensible à une lumière d'illumination par l'intermédiaire du réticule (5), et comprenant un dispositif d'alimentation (31, 32, 43, 46) destiné à fournir un gaz (par exemple de l'hélium) ayant un facteur de transmission élevé à une lumière d'illumination dans une chambre hermétique (cylindre de lentilles, etc.) comportant au moins une partie (par exemple un système optique de projection (PL), un système optique d'illumination, la source de lumière (1)) d'un chemin de lumière d'illumination, un dispositif de récupération (33, 34) destiné à récupérer au moins une partie du gaz fourni, ainsi qu'un dispositif de purification (35, 37, 80) destiné à extraire du gaz récupéré des substances changeant les caractéristiques optiques dans une atmosphère alimentée en gaz.
PCT/JP1999/005633 1998-10-13 1999-10-13 Systeme d'exposition WO2000022656A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU61218/99A AU6121899A (en) 1998-10-13 1999-10-13 Exposure system

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP29032698 1998-10-13
JP10/290326 1998-10-13

Publications (1)

Publication Number Publication Date
WO2000022656A1 true WO2000022656A1 (fr) 2000-04-20

Family

ID=17754637

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP1999/005633 WO2000022656A1 (fr) 1998-10-13 1999-10-13 Systeme d'exposition

Country Status (3)

Country Link
AU (1) AU6121899A (fr)
TW (1) TW439114B (fr)
WO (1) WO2000022656A1 (fr)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002075795A1 (fr) * 2001-03-19 2002-09-26 Nikon Corporation Procede et dispositif d'exposition et procede pour produire ledit dispositif
JP2003068629A (ja) * 2001-08-29 2003-03-07 Kyocera Corp 露光装置
JP2003068630A (ja) * 2001-08-29 2003-03-07 Kyocera Corp 露光装置
US6633364B2 (en) 2000-03-31 2003-10-14 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
JP2008004969A (ja) * 2002-09-13 2008-01-10 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
JP2008034740A (ja) * 2006-07-31 2008-02-14 Dainippon Screen Mfg Co Ltd ロードロック装置、それを備えた基板処理装置および基板処理システム
JP2012089840A (ja) * 2010-10-19 2012-05-10 Asml Netherlands Bv ガスマニホールド、リソグラフィ装置用モジュール、リソグラフィ装置、及びデバイス製造方法
TWI720590B (zh) 2017-03-15 2021-03-01 荷蘭商Ａｓｍｌ荷蘭公司 用於輸送氣體之設備及用於產生高諧波輻射之照明源

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111929990B (zh) * 2020-07-31 2023-02-07 中国科学院微电子研究所 氢离子捕捉器、防硫酸铵系统、光刻系统及防硫酸铵方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06176998A (ja) * 1992-12-10 1994-06-24 Canon Inc 半導体製造装置
JPH0737783A (ja) * 1993-07-20 1995-02-07 Fujitsu Ltd 露光装置
US5430303A (en) * 1992-07-01 1995-07-04 Nikon Corporation Exposure apparatus
JPH09270385A (ja) * 1996-03-29 1997-10-14 Nikon Corp 露光装置の環境制御装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5430303A (en) * 1992-07-01 1995-07-04 Nikon Corporation Exposure apparatus
JPH06176998A (ja) * 1992-12-10 1994-06-24 Canon Inc 半導体製造装置
JPH0737783A (ja) * 1993-07-20 1995-02-07 Fujitsu Ltd 露光装置
JPH09270385A (ja) * 1996-03-29 1997-10-14 Nikon Corp 露光装置の環境制御装置

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6633364B2 (en) 2000-03-31 2003-10-14 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
WO2002075795A1 (fr) * 2001-03-19 2002-09-26 Nikon Corporation Procede et dispositif d'exposition et procede pour produire ledit dispositif
JP2003068629A (ja) * 2001-08-29 2003-03-07 Kyocera Corp 露光装置
JP2003068630A (ja) * 2001-08-29 2003-03-07 Kyocera Corp 露光装置
JP4721575B2 (ja) * 2001-08-29 2011-07-13 京セラ株式会社 露光装置
JP2008004969A (ja) * 2002-09-13 2008-01-10 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
JP2008034740A (ja) * 2006-07-31 2008-02-14 Dainippon Screen Mfg Co Ltd ロードロック装置、それを備えた基板処理装置および基板処理システム
JP2012089840A (ja) * 2010-10-19 2012-05-10 Asml Netherlands Bv ガスマニホールド、リソグラフィ装置用モジュール、リソグラフィ装置、及びデバイス製造方法
US8675169B2 (en) 2010-10-19 2014-03-18 Asml Netherlands B.V. Gas manifold, module for a lithographic apparatus, lithographic apparatus and device manufacturing method
TWI720590B (zh) 2017-03-15 2021-03-01 荷蘭商Ａｓｍｌ荷蘭公司 用於輸送氣體之設備及用於產生高諧波輻射之照明源

Also Published As

Publication number Publication date
TW439114B (en) 2001-06-07
AU6121899A (en) 2000-05-01

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