AU6121899A - Exposure system - Google Patents
Exposure systemInfo
- Publication number
- AU6121899A AU6121899A AU61218/99A AU6121899A AU6121899A AU 6121899 A AU6121899 A AU 6121899A AU 61218/99 A AU61218/99 A AU 61218/99A AU 6121899 A AU6121899 A AU 6121899A AU 6121899 A AU6121899 A AU 6121899A
- Authority
- AU
- Australia
- Prior art keywords
- exposure system
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29032698 | 1998-10-13 | ||
JP10/290326 | 1998-10-13 | ||
PCT/JP1999/005633 WO2000022656A1 (en) | 1998-10-13 | 1999-10-13 | Exposure system |
Publications (1)
Publication Number | Publication Date |
---|---|
AU6121899A true AU6121899A (en) | 2000-05-01 |
Family
ID=17754637
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU61218/99A Abandoned AU6121899A (en) | 1998-10-13 | 1999-10-13 | Exposure system |
Country Status (3)
Country | Link |
---|---|
AU (1) | AU6121899A (en) |
TW (1) | TW439114B (en) |
WO (1) | WO2000022656A1 (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001345263A (en) | 2000-03-31 | 2001-12-14 | Nikon Corp | Aligner, exposure method, and device-manufacturing method |
WO2002075795A1 (en) * | 2001-03-19 | 2002-09-26 | Nikon Corporation | Method and device for exposure, and method of manufacturing device |
JP2003068630A (en) * | 2001-08-29 | 2003-03-07 | Kyocera Corp | Aligner |
JP4721575B2 (en) * | 2001-08-29 | 2011-07-13 | 京セラ株式会社 | Exposure equipment |
KR20040024516A (en) * | 2002-09-13 | 2004-03-20 | 에이에스엠엘 네델란즈 비.브이. | Lithographic apparatus and device manufacturing method |
JP2008034740A (en) * | 2006-07-31 | 2008-02-14 | Dainippon Screen Mfg Co Ltd | Load lock device, substrate processing apparatus and substrate processing system equipped therewith |
NL2007439A (en) | 2010-10-19 | 2012-04-23 | Asml Netherlands Bv | Gas manifold, module for a lithographic apparatus, lithographic apparatus and device manufacturing method. |
CN110462521B (en) | 2017-03-15 | 2022-10-18 | Asml荷兰有限公司 | Apparatus for delivering gas and irradiation source for generating high harmonic radiation |
CN111929990B (en) * | 2020-07-31 | 2023-02-07 | 中国科学院微电子研究所 | Hydrogen ion trap, ammonium sulfate prevention system, photoetching system and ammonium sulfate prevention method |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5430303A (en) * | 1992-07-01 | 1995-07-04 | Nikon Corporation | Exposure apparatus |
JP3031790B2 (en) * | 1992-12-10 | 2000-04-10 | キヤノン株式会社 | Semiconductor manufacturing equipment |
JPH0737783A (en) * | 1993-07-20 | 1995-02-07 | Fujitsu Ltd | Aligner |
JPH09270385A (en) * | 1996-03-29 | 1997-10-14 | Nikon Corp | Environmental control device for exposure device |
-
1999
- 1999-10-13 WO PCT/JP1999/005633 patent/WO2000022656A1/en active Application Filing
- 1999-10-13 AU AU61218/99A patent/AU6121899A/en not_active Abandoned
- 1999-10-13 TW TW88117652A patent/TW439114B/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
WO2000022656A1 (en) | 2000-04-20 |
TW439114B (en) | 2001-06-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |