JPH0794760A - 過負荷安全装置を有するマイクロメカニカルセンサの製造方法およびこの種のセンサ - Google Patents

過負荷安全装置を有するマイクロメカニカルセンサの製造方法およびこの種のセンサ

Info

Publication number
JPH0794760A
JPH0794760A JP10624691A JP10624691A JPH0794760A JP H0794760 A JPH0794760 A JP H0794760A JP 10624691 A JP10624691 A JP 10624691A JP 10624691 A JP10624691 A JP 10624691A JP H0794760 A JPH0794760 A JP H0794760A
Authority
JP
Japan
Prior art keywords
etching
safety device
paddle
silicon wafer
structured
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10624691A
Other languages
English (en)
Japanese (ja)
Inventor
Frank Bantien
バンティエン フランク
Guenther Findler
フィントラー ギュンター
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Robert Bosch GmbH
Original Assignee
Robert Bosch GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Robert Bosch GmbH filed Critical Robert Bosch GmbH
Publication of JPH0794760A publication Critical patent/JPH0794760A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P15/0802—Details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Pressure Sensors (AREA)
  • Weting (AREA)
  • Micromachines (AREA)
JP10624691A 1990-05-22 1991-05-13 過負荷安全装置を有するマイクロメカニカルセンサの製造方法およびこの種のセンサ Pending JPH0794760A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19904016472 DE4016472A1 (de) 1990-05-22 1990-05-22 Verfahren zur herstellung von mikromechanischen sensoren mit ueberlastsicherung
DE4016472.1 1990-05-22

Publications (1)

Publication Number Publication Date
JPH0794760A true JPH0794760A (ja) 1995-04-07

Family

ID=6406957

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10624691A Pending JPH0794760A (ja) 1990-05-22 1991-05-13 過負荷安全装置を有するマイクロメカニカルセンサの製造方法およびこの種のセンサ

Country Status (4)

Country Link
JP (1) JPH0794760A (enExample)
CH (1) CH681921A5 (enExample)
DE (1) DE4016472A1 (enExample)
GB (1) GB2245366A (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5233213A (en) * 1990-07-14 1993-08-03 Robert Bosch Gmbh Silicon-mass angular acceleration sensor
US5264696A (en) * 1991-05-20 1993-11-23 Olympus Optical Co., Ltd. Cantilever chip for scanning probe microscope having first and second probes formed with different aspect ratios
DE4129218A1 (de) * 1991-09-03 1993-03-04 Deutsche Aerospace Beschleunigungssensor, auf mikromechanischem wege hergestellt
DE4206677C1 (enExample) * 1992-02-28 1993-09-02 Siemens Ag, 80333 Muenchen, De
DE4331798B4 (de) * 1993-09-18 2004-08-26 Robert Bosch Gmbh Verfahren zur Herstellung von mikromechanischen Bauelementen
DE19522004A1 (de) * 1995-06-21 1997-01-02 Inst Mikrotechnik Mainz Gmbh Herstellungsverfahren von teilbeweglichen Mikrostrukturen auf der Basis einer trockenchemisch geätzten Opferschicht
FR2742230B1 (fr) * 1995-12-12 1998-01-09 Sextant Avionique Accelerometre et procede de fabrication
DE19608370A1 (de) * 1996-03-05 1996-07-25 Josef Dr Lechner Verfahren zur Herstellung mikromechanischer Kanäle mit Anschluß an die Umgebungsatmosphäre
US6555480B2 (en) 2001-07-31 2003-04-29 Hewlett-Packard Development Company, L.P. Substrate with fluidic channel and method of manufacturing
US6554403B1 (en) 2002-04-30 2003-04-29 Hewlett-Packard Development Company, L.P. Substrate for fluid ejection device
US6981759B2 (en) 2002-04-30 2006-01-03 Hewlett-Packard Development Company, Lp. Substrate and method forming substrate for fluid ejection device
JP4216525B2 (ja) * 2002-05-13 2009-01-28 株式会社ワコー 加速度センサおよびその製造方法
US6883903B2 (en) 2003-01-21 2005-04-26 Martha A. Truninger Flextensional transducer and method of forming flextensional transducer
US6821450B2 (en) 2003-01-21 2004-11-23 Hewlett-Packard Development Company, L.P. Substrate and method of forming substrate for fluid ejection device
US6910758B2 (en) 2003-07-15 2005-06-28 Hewlett-Packard Development Company, L.P. Substrate and method of forming substrate for fluid ejection device
DE10334243B4 (de) * 2003-07-28 2013-11-28 Robert Bosch Gmbh Mikromechanisches Verfahren zum Herstellen eines flexiblen Schichtelements
DE10345447B4 (de) * 2003-09-30 2007-04-26 Infineon Technologies Ag Verfahren zum Herstellen eines Halbleiter-Bauteils
WO2008012846A1 (en) * 2006-07-26 2008-01-31 Stmicroelectronics S.R.L. Planar microelectromechanical device having a stopper structure for out-of-plane movements
CN106290985B (zh) * 2016-07-26 2019-04-12 广东合微集成电路技术有限公司 一种电容式复合传感器及其制造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4522682A (en) * 1982-06-21 1985-06-11 Rockwell International Corporation Method for producing PNP type lateral transistor separated from substrate by O.D.E. for minimal interference therefrom
US4597003A (en) * 1983-12-01 1986-06-24 Harry E. Aine Chemical etching of a semiconductive wafer by undercutting an etch stopped layer
US4670092A (en) * 1986-04-18 1987-06-02 Rockwell International Corporation Method of fabricating a cantilever beam for a monolithic accelerometer
DE3802545A1 (de) * 1988-01-28 1989-08-10 Fraunhofer Ges Forschung Mikropumpe zur foerderung kleinster gasmengen
US4882933A (en) * 1988-06-03 1989-11-28 Novasensor Accelerometer with integral bidirectional shock protection and controllable viscous damping

Also Published As

Publication number Publication date
CH681921A5 (enExample) 1993-06-15
GB9110581D0 (en) 1991-07-03
GB2245366A (en) 1992-01-02
DE4016472C2 (enExample) 1992-04-09
DE4016472A1 (de) 1991-11-28

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