JPH07509500A - ポリアミド材料 - Google Patents
ポリアミド材料Info
- Publication number
- JPH07509500A JPH07509500A JP5508225A JP50822593A JPH07509500A JP H07509500 A JPH07509500 A JP H07509500A JP 5508225 A JP5508225 A JP 5508225A JP 50822593 A JP50822593 A JP 50822593A JP H07509500 A JPH07509500 A JP H07509500A
- Authority
- JP
- Japan
- Prior art keywords
- optionally substituted
- group
- alkyl group
- polyamide
- phenyl group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polyamides (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
Claims (7)
- 1.線状ポリアミドと光架橋剤としての2置換アントラキノンを含んでいる光架 橋性材料。
- 2.該2置換アントラキノンが、式 ▲数式、化学式、表等があります▼ [式中、 Xは、OR (ここで、Rは任意に置換されていてもよいアルキル基、任意に置換されていて もよいフェニル基または(メタ)アクリリル基である)であるか、 ▲数式、化学式、表等があります▼ (ここで、Rが(メタ)アクリリル基でありそしてR1が水素、任意に置換され ていてもよいアルキル基、または任意に置換されていてもよいフェニル基である か、或は Rが水素でありそしてR1が任意に置換されていてもよいアルキル基、または任 意に置換されていてもよいフェニル基である)であるか、 C(O)−R (ここで、Rは任意に置換されていてもよいアルキル基、または任意に置換され ていてもよいフェニル基である)であるか、 OR1 (ここで、R1は任意に置換されていてもよいアルキル基、任意に置換されてい てもよいフェニル基、または任意に置換されていてもよいビニル基である) であってもよい] で表されることを特徴とする請求の範囲1記載の光架橋性材料。
- 3.該2置換アントラキノンが2−アクリルアミドアントラキノン(X=NHC (O)CH=CH2)、2−アクリルオキシアントラキノン(X=OC(O)C H=CH2)または2−ベンゾイルアミノアントラキノン(X=NHC(O)C 6H5)であることを特徴とする請求の範囲2記載の光架橋性材料。
- 4.該ポリアミドがポリヘキサメチレンジアミンまたはポリカプロラクタムであ ることを特徴とする前請求の範囲いずれか記載の光架橋性材料。
- 5.2置換アントラキノンがその中に組み込まれているか或はそれの表面上にコ ートされているポリアミドを含んでいる溶媒キャストフィルム。
- 6.2置換アントラキノンがその中に組み込まれているか或はそれの表面上にコ ートされているポリアミドを含んでいる溶融紡糸繊維。
- 7.式 ▲数式、化学式、表等があります▼ [式中、 Rは水素またはメチル基である] で表される光開始剤。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9122989.8 | 1991-10-30 | ||
GB919122989A GB9122989D0 (en) | 1991-10-30 | 1991-10-30 | Polyamide materials |
PCT/GB1992/001889 WO1993009471A1 (en) | 1991-10-30 | 1992-10-15 | Polyamide materials |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH07509500A true JPH07509500A (ja) | 1995-10-19 |
JP3251014B2 JP3251014B2 (ja) | 2002-01-28 |
Family
ID=10703746
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50822593A Expired - Lifetime JP3251014B2 (ja) | 1991-10-30 | 1992-10-15 | ポリアミド材料 |
Country Status (9)
Country | Link |
---|---|
US (1) | US5512606A (ja) |
EP (1) | EP0610256B1 (ja) |
JP (1) | JP3251014B2 (ja) |
KR (1) | KR100292639B1 (ja) |
AU (1) | AU2696692A (ja) |
DE (1) | DE69228067T2 (ja) |
GB (1) | GB9122989D0 (ja) |
WO (1) | WO1993009471A1 (ja) |
ZA (1) | ZA928106B (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016171233A1 (ja) * | 2015-04-22 | 2016-10-27 | 日産化学工業株式会社 | 感光性繊維及び繊維パターンの形成方法 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB9315093D0 (en) * | 1993-07-21 | 1993-09-01 | Zeneca Ltd | Photoinitiator compositions |
US7157535B2 (en) * | 2002-06-19 | 2007-01-02 | National Starch And Chemical Investment Holding Corporation | Polymeric photoinitiators |
KR101320894B1 (ko) * | 2006-07-05 | 2013-10-24 | 삼성디스플레이 주식회사 | 포토레지스트 조성물 및 이를 이용한 컬러 필터 기판의제조방법 |
CN117402351B (zh) * | 2023-12-14 | 2024-02-13 | 山东广垠新材料有限公司 | 光致交联/解交联尼龙材料及其制备方法和应用 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3591661A (en) * | 1969-07-23 | 1971-07-06 | Du Pont | Polymeric photosensitizers |
JPS6032175B2 (ja) * | 1977-05-18 | 1985-07-26 | バスフ アクチェン ゲゼルシャフト | 版木及びレリ−フ版木を製造するために改良された光重合可能な物質 |
JPS62187848A (ja) * | 1986-02-10 | 1987-08-17 | Fuotopori Ouka Kk | 感光性樹脂表面の粘着防止方法 |
US4988664A (en) * | 1989-07-21 | 1991-01-29 | Minnesota Mining And Manufacturing Company | Thermal transfer imaging using alkylcarbonylamino-anthraquinone dyes |
GB9123914D0 (en) * | 1991-11-11 | 1992-01-02 | Ici Plc | Polymerisable compositions |
-
1991
- 1991-10-30 GB GB919122989A patent/GB9122989D0/en active Pending
-
1992
- 1992-10-15 EP EP92921152A patent/EP0610256B1/en not_active Expired - Lifetime
- 1992-10-15 WO PCT/GB1992/001889 patent/WO1993009471A1/en active IP Right Grant
- 1992-10-15 US US08/232,138 patent/US5512606A/en not_active Expired - Lifetime
- 1992-10-15 DE DE69228067T patent/DE69228067T2/de not_active Expired - Fee Related
- 1992-10-15 KR KR1019940701447A patent/KR100292639B1/ko not_active IP Right Cessation
- 1992-10-15 JP JP50822593A patent/JP3251014B2/ja not_active Expired - Lifetime
- 1992-10-15 AU AU26966/92A patent/AU2696692A/en not_active Abandoned
- 1992-10-20 ZA ZA928106A patent/ZA928106B/xx unknown
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016171233A1 (ja) * | 2015-04-22 | 2016-10-27 | 日産化学工業株式会社 | 感光性繊維及び繊維パターンの形成方法 |
Also Published As
Publication number | Publication date |
---|---|
EP0610256B1 (en) | 1998-12-30 |
EP0610256A1 (en) | 1994-08-17 |
ZA928106B (en) | 1993-08-27 |
GB9122989D0 (en) | 1991-12-18 |
DE69228067T2 (de) | 1999-07-15 |
KR100292639B1 (ko) | 2001-09-17 |
KR940704015A (ko) | 1994-12-12 |
WO1993009471A1 (en) | 1993-05-13 |
US5512606A (en) | 1996-04-30 |
DE69228067D1 (de) | 1999-02-11 |
AU2696692A (en) | 1993-06-07 |
JP3251014B2 (ja) | 2002-01-28 |
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