ZA928106B - Polyamide materials - Google Patents

Polyamide materials

Info

Publication number
ZA928106B
ZA928106B ZA928106A ZA928106A ZA928106B ZA 928106 B ZA928106 B ZA 928106B ZA 928106 A ZA928106 A ZA 928106A ZA 928106 A ZA928106 A ZA 928106A ZA 928106 B ZA928106 B ZA 928106B
Authority
ZA
South Africa
Prior art keywords
polyamide materials
polyamide
materials
Prior art date
Application number
ZA928106A
Other languages
English (en)
Inventor
Normal Sydney Allen
John Patrick Hurley
Original Assignee
Ici Plc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ici Plc filed Critical Ici Plc
Publication of ZA928106B publication Critical patent/ZA928106B/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/008Azides
    • G03F7/012Macromolecular azides; Macromolecular additives, e.g. binders
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polyamides (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
ZA928106A 1991-10-30 1992-10-20 Polyamide materials ZA928106B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB919122989A GB9122989D0 (en) 1991-10-30 1991-10-30 Polyamide materials

Publications (1)

Publication Number Publication Date
ZA928106B true ZA928106B (en) 1993-08-27

Family

ID=10703746

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA928106A ZA928106B (en) 1991-10-30 1992-10-20 Polyamide materials

Country Status (9)

Country Link
US (1) US5512606A (ja)
EP (1) EP0610256B1 (ja)
JP (1) JP3251014B2 (ja)
KR (1) KR100292639B1 (ja)
AU (1) AU2696692A (ja)
DE (1) DE69228067T2 (ja)
GB (1) GB9122989D0 (ja)
WO (1) WO1993009471A1 (ja)
ZA (1) ZA928106B (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9315093D0 (en) * 1993-07-21 1993-09-01 Zeneca Ltd Photoinitiator compositions
US7157535B2 (en) * 2002-06-19 2007-01-02 National Starch And Chemical Investment Holding Corporation Polymeric photoinitiators
KR101320894B1 (ko) * 2006-07-05 2013-10-24 삼성디스플레이 주식회사 포토레지스트 조성물 및 이를 이용한 컬러 필터 기판의제조방법
EP3287551A4 (en) * 2015-04-22 2018-10-03 Nissan Chemical Corporation Photosensitive fibers and method for forming fiber pattern
CN117402351B (zh) * 2023-12-14 2024-02-13 山东广垠新材料有限公司 光致交联/解交联尼龙材料及其制备方法和应用

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3591661A (en) * 1969-07-23 1971-07-06 Du Pont Polymeric photosensitizers
JPS6032175B2 (ja) * 1977-05-18 1985-07-26 バスフ アクチェン ゲゼルシャフト 版木及びレリ−フ版木を製造するために改良された光重合可能な物質
JPS62187848A (ja) * 1986-02-10 1987-08-17 Fuotopori Ouka Kk 感光性樹脂表面の粘着防止方法
US4988664A (en) * 1989-07-21 1991-01-29 Minnesota Mining And Manufacturing Company Thermal transfer imaging using alkylcarbonylamino-anthraquinone dyes
GB9123914D0 (en) * 1991-11-11 1992-01-02 Ici Plc Polymerisable compositions

Also Published As

Publication number Publication date
GB9122989D0 (en) 1991-12-18
US5512606A (en) 1996-04-30
JP3251014B2 (ja) 2002-01-28
KR940704015A (ko) 1994-12-12
AU2696692A (en) 1993-06-07
EP0610256B1 (en) 1998-12-30
EP0610256A1 (en) 1994-08-17
JPH07509500A (ja) 1995-10-19
KR100292639B1 (ko) 2001-09-17
DE69228067D1 (de) 1999-02-11
WO1993009471A1 (en) 1993-05-13
DE69228067T2 (de) 1999-07-15

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