JPH0627651Y2 - 膜形成用反応装置 - Google Patents

膜形成用反応装置

Info

Publication number
JPH0627651Y2
JPH0627651Y2 JP12338189U JP12338189U JPH0627651Y2 JP H0627651 Y2 JPH0627651 Y2 JP H0627651Y2 JP 12338189 U JP12338189 U JP 12338189U JP 12338189 U JP12338189 U JP 12338189U JP H0627651 Y2 JPH0627651 Y2 JP H0627651Y2
Authority
JP
Japan
Prior art keywords
shutter
reaction chamber
substrate
inlet
outlet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP12338189U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0363573U (US07923587-20110412-C00022.png
Inventor
研吾 中野
浩一 廣瀬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP12338189U priority Critical patent/JPH0627651Y2/ja
Publication of JPH0363573U publication Critical patent/JPH0363573U/ja
Application granted granted Critical
Publication of JPH0627651Y2 publication Critical patent/JPH0627651Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
JP12338189U 1989-10-20 1989-10-20 膜形成用反応装置 Expired - Lifetime JPH0627651Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12338189U JPH0627651Y2 (ja) 1989-10-20 1989-10-20 膜形成用反応装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12338189U JPH0627651Y2 (ja) 1989-10-20 1989-10-20 膜形成用反応装置

Publications (2)

Publication Number Publication Date
JPH0363573U JPH0363573U (US07923587-20110412-C00022.png) 1991-06-20
JPH0627651Y2 true JPH0627651Y2 (ja) 1994-07-27

Family

ID=31671362

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12338189U Expired - Lifetime JPH0627651Y2 (ja) 1989-10-20 1989-10-20 膜形成用反応装置

Country Status (1)

Country Link
JP (1) JPH0627651Y2 (US07923587-20110412-C00022.png)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8460466B2 (en) * 2010-08-02 2013-06-11 Veeco Instruments Inc. Exhaust for CVD reactor
WO2012092064A1 (en) 2010-12-30 2012-07-05 Veeco Instruments Inc. Wafer processing with carrier extension
US9388493B2 (en) 2013-01-08 2016-07-12 Veeco Instruments Inc. Self-cleaning shutter for CVD reactor

Also Published As

Publication number Publication date
JPH0363573U (US07923587-20110412-C00022.png) 1991-06-20

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