JPH0588779B2 - - Google Patents
Info
- Publication number
- JPH0588779B2 JPH0588779B2 JP63113355A JP11335588A JPH0588779B2 JP H0588779 B2 JPH0588779 B2 JP H0588779B2 JP 63113355 A JP63113355 A JP 63113355A JP 11335588 A JP11335588 A JP 11335588A JP H0588779 B2 JPH0588779 B2 JP H0588779B2
- Authority
- JP
- Japan
- Prior art keywords
- image
- subject
- memory
- relative frequency
- pixel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
- G01R31/2601—Apparatus or methods therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
- G01R31/265—Contactless testing
- G01R31/2656—Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Electromagnetism (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Image Processing (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63113355A JPH01284743A (ja) | 1988-05-10 | 1988-05-10 | 半導体装置の樹脂モールドの外観検査方法とその検査装置 |
| EP89108384A EP0341685B1 (en) | 1988-05-10 | 1989-05-10 | Image processing apparatus and method for inspecting defects of enclosures of semiconductor devices |
| KR1019890006231A KR920003932B1 (ko) | 1988-05-10 | 1989-05-10 | 반도체장치의 수지모울드의 외관검사방법과 그 외관검사장치 |
| DE68924092T DE68924092T2 (de) | 1988-05-10 | 1989-05-10 | Bildbearbeitungsapparat und Verfahren zur Inspektion von Fehlern von Halbleiterbehältern. |
| US07/931,517 US5568564A (en) | 1988-05-10 | 1992-08-21 | Image processing apparatus and method for inspecting defects of enclosures of semiconductor devices |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63113355A JPH01284743A (ja) | 1988-05-10 | 1988-05-10 | 半導体装置の樹脂モールドの外観検査方法とその検査装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01284743A JPH01284743A (ja) | 1989-11-16 |
| JPH0588779B2 true JPH0588779B2 (enExample) | 1993-12-24 |
Family
ID=14610172
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63113355A Granted JPH01284743A (ja) | 1988-05-10 | 1988-05-10 | 半導体装置の樹脂モールドの外観検査方法とその検査装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US5568564A (enExample) |
| EP (1) | EP0341685B1 (enExample) |
| JP (1) | JPH01284743A (enExample) |
| KR (1) | KR920003932B1 (enExample) |
| DE (1) | DE68924092T2 (enExample) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2803388B2 (ja) * | 1991-04-26 | 1998-09-24 | 三菱電機株式会社 | 部品検査装置 |
| US5793642A (en) * | 1997-01-21 | 1998-08-11 | Tektronix, Inc. | Histogram based testing of analog signals |
| JP3793977B2 (ja) * | 1997-01-30 | 2006-07-05 | ソニー株式会社 | 画像照合装置 |
| US7184594B1 (en) * | 1999-01-18 | 2007-02-27 | Nikon Corporation | Pattern matching method and device, position determining method and device, position aligning method and device, exposing method and device, and device and its production method |
| US6488405B1 (en) * | 2000-03-08 | 2002-12-03 | Advanced Micro Devices, Inc. | Flip chip defect analysis using liquid crystal |
| JP4743805B2 (ja) * | 2000-04-06 | 2011-08-10 | ルネサスエレクトロニクス株式会社 | 外観検査方法および装置 |
| US7151850B2 (en) * | 2001-10-30 | 2006-12-19 | Matsushita Electric Industrial Co., Ltd. | Apparatus and method for setting teaching data, teaching data providing system over network |
| JP2003248008A (ja) * | 2001-12-18 | 2003-09-05 | Inst Of Physical & Chemical Res | 反応液の攪拌方法 |
| JP4254204B2 (ja) * | 2001-12-19 | 2009-04-15 | 富士ゼロックス株式会社 | 画像照合装置、画像形成装置及び画像照合プログラム |
| JP2003240521A (ja) * | 2002-02-21 | 2003-08-27 | Bridgestone Corp | 被検体の外観・形状検査方法とその装置、及び、被検体の外観・形状検出装置 |
| DE102005017642B4 (de) * | 2005-04-15 | 2010-04-08 | Vistec Semiconductor Systems Jena Gmbh | Verfahren zur Inspektion eines Wafers |
| JP5004478B2 (ja) * | 2006-02-17 | 2012-08-22 | 日立造船株式会社 | 物体の判別方法および判別装置 |
| KR100940301B1 (ko) * | 2008-03-26 | 2010-02-05 | 호서대학교 산학협력단 | 마크 분할 검사 방법 |
| JP7303720B2 (ja) * | 2019-10-15 | 2023-07-05 | ケミカルグラウト株式会社 | 地層構造解析システム及びプログラム |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4472736A (en) * | 1980-03-11 | 1984-09-18 | Dainippon Ink And Chemicals Incorporated | Lithographic reproduction original classification and color separation tone curve adjustment |
| US4484081A (en) * | 1980-09-19 | 1984-11-20 | Trw Inc. | Defect analysis system |
| JPH0722166B2 (ja) * | 1982-09-22 | 1995-03-08 | 株式会社東芝 | ダイボンダ等におけるペレツト認識方法 |
| JPS6083328A (ja) * | 1983-10-13 | 1985-05-11 | Fujitsu Ltd | フオトマスクの検査方法 |
| GB8331248D0 (en) * | 1983-11-23 | 1983-12-29 | Kearney & Trecker Marwin Ltd | Inspecting articles |
| JPS6342575A (ja) * | 1986-08-08 | 1988-02-23 | Dainippon Screen Mfg Co Ltd | 階調変換方法およびその装置 |
| DE3750285T2 (de) * | 1986-10-03 | 1995-03-30 | Omron Tateisi Electronics Co | Gerät zur Untersuchung einer elektronischen Vorrichtung in fester Baugruppe. |
-
1988
- 1988-05-10 JP JP63113355A patent/JPH01284743A/ja active Granted
-
1989
- 1989-05-10 EP EP89108384A patent/EP0341685B1/en not_active Expired - Lifetime
- 1989-05-10 KR KR1019890006231A patent/KR920003932B1/ko not_active Expired
- 1989-05-10 DE DE68924092T patent/DE68924092T2/de not_active Expired - Fee Related
-
1992
- 1992-08-21 US US07/931,517 patent/US5568564A/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| DE68924092T2 (de) | 1996-03-21 |
| US5568564A (en) | 1996-10-22 |
| KR920003932B1 (ko) | 1992-05-18 |
| EP0341685A3 (en) | 1990-12-19 |
| DE68924092D1 (de) | 1995-10-12 |
| EP0341685A2 (en) | 1989-11-15 |
| EP0341685B1 (en) | 1995-09-06 |
| JPH01284743A (ja) | 1989-11-16 |
| KR890017545A (ko) | 1989-12-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |