JPH0586642B2 - - Google Patents

Info

Publication number
JPH0586642B2
JPH0586642B2 JP58224080A JP22408083A JPH0586642B2 JP H0586642 B2 JPH0586642 B2 JP H0586642B2 JP 58224080 A JP58224080 A JP 58224080A JP 22408083 A JP22408083 A JP 22408083A JP H0586642 B2 JPH0586642 B2 JP H0586642B2
Authority
JP
Japan
Prior art keywords
resist
cooling
temperature
forming
resist pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58224080A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60117627A (ja
Inventor
Toshiaki Shinozaki
Kei Kirita
Yoshihide Kato
Nobuji Tsucha
Kinya Usuda
Fumiaki Shigemitsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP22408083A priority Critical patent/JPS60117627A/ja
Publication of JPS60117627A publication Critical patent/JPS60117627A/ja
Publication of JPH0586642B2 publication Critical patent/JPH0586642B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP22408083A 1983-11-30 1983-11-30 レジストパタ−ンの形成方法及びレジスト処理装置 Granted JPS60117627A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22408083A JPS60117627A (ja) 1983-11-30 1983-11-30 レジストパタ−ンの形成方法及びレジスト処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22408083A JPS60117627A (ja) 1983-11-30 1983-11-30 レジストパタ−ンの形成方法及びレジスト処理装置

Publications (2)

Publication Number Publication Date
JPS60117627A JPS60117627A (ja) 1985-06-25
JPH0586642B2 true JPH0586642B2 (en, 2012) 1993-12-13

Family

ID=16808241

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22408083A Granted JPS60117627A (ja) 1983-11-30 1983-11-30 レジストパタ−ンの形成方法及びレジスト処理装置

Country Status (1)

Country Link
JP (1) JPS60117627A (en, 2012)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR860002082B1 (ko) * 1983-01-19 1986-11-24 가부시기가이샤 도시바 레지스트 패턴의 형성 방법 및 장치
JP2559153B2 (ja) * 1990-03-23 1996-12-04 リソテックジャパン株式会社 現像方法および装置
JP2776453B2 (ja) * 1993-02-19 1998-07-16 日本ビクター株式会社 フォトレジスト現像装置及び現像方法
WO2006025183A1 (ja) * 2004-08-30 2006-03-09 Daikin Industries, Ltd. ウェハ温度調整装置及びウェハ温度調整方法
US8357244B1 (en) * 2007-06-28 2013-01-22 Western Digital (Fremont), Llc Method for lifting off photoresist beneath an overlayer

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5528061A (en) * 1978-08-22 1980-02-28 Fuji Xerox Co Ltd Shade eliminating method in electrostatic copier
JPS5614975A (en) * 1979-07-17 1981-02-13 Rhythm Watch Co Ltd Driving circuit of clock motor
JPS58176936A (ja) * 1982-04-09 1983-10-17 Fujitsu Ltd 基板冷却方法

Also Published As

Publication number Publication date
JPS60117627A (ja) 1985-06-25

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