JPH0464171B2 - - Google Patents

Info

Publication number
JPH0464171B2
JPH0464171B2 JP58070433A JP7043383A JPH0464171B2 JP H0464171 B2 JPH0464171 B2 JP H0464171B2 JP 58070433 A JP58070433 A JP 58070433A JP 7043383 A JP7043383 A JP 7043383A JP H0464171 B2 JPH0464171 B2 JP H0464171B2
Authority
JP
Japan
Prior art keywords
resist
substrate
cooling
baking
cold air
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58070433A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59195829A (ja
Inventor
Kei Kirita
Yoshihide Kato
Toshiaki Shinozaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP58070433A priority Critical patent/JPS59195829A/ja
Publication of JPS59195829A publication Critical patent/JPS59195829A/ja
Publication of JPH0464171B2 publication Critical patent/JPH0464171B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58070433A 1983-04-21 1983-04-21 レジストパタ−ン形成方法及びレジスト処理装置 Granted JPS59195829A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58070433A JPS59195829A (ja) 1983-04-21 1983-04-21 レジストパタ−ン形成方法及びレジスト処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58070433A JPS59195829A (ja) 1983-04-21 1983-04-21 レジストパタ−ン形成方法及びレジスト処理装置

Publications (2)

Publication Number Publication Date
JPS59195829A JPS59195829A (ja) 1984-11-07
JPH0464171B2 true JPH0464171B2 (en, 2012) 1992-10-14

Family

ID=13431337

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58070433A Granted JPS59195829A (ja) 1983-04-21 1983-04-21 レジストパタ−ン形成方法及びレジスト処理装置

Country Status (1)

Country Link
JP (1) JPS59195829A (en, 2012)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3272815B2 (ja) * 1993-05-20 2002-04-08 株式会社東芝 レジスト感度調整装置および方法
JP4920765B2 (ja) * 2010-05-21 2012-04-18 株式会社朝日工業社 ガラス基板温調用ノズル構造
JP4975180B2 (ja) * 2011-08-29 2012-07-11 株式会社朝日工業社 ガラス基板温調用ノズル構造

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5948925A (ja) * 1982-09-14 1984-03-21 Dainippon Screen Mfg Co Ltd 加熱乾燥した薬液塗布用基板の冷却方法及び装置

Also Published As

Publication number Publication date
JPS59195829A (ja) 1984-11-07

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