JPH0585219B2 - - Google Patents
Info
- Publication number
- JPH0585219B2 JPH0585219B2 JP59202140A JP20214084A JPH0585219B2 JP H0585219 B2 JPH0585219 B2 JP H0585219B2 JP 59202140 A JP59202140 A JP 59202140A JP 20214084 A JP20214084 A JP 20214084A JP H0585219 B2 JPH0585219 B2 JP H0585219B2
- Authority
- JP
- Japan
- Prior art keywords
- polymer
- metal
- particles
- palladium
- electroless
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
- C23C18/30—Activating or accelerating or sensitising with palladium or other noble metal
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/386—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive
- H05K3/387—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive for electroless plating
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
- Catalysts (AREA)
- Manufacturing Of Printed Wiring (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US53692583A | 1983-09-28 | 1983-09-28 | |
| US536925 | 1983-09-28 | ||
| GB08424618A GB2164954A (en) | 1983-09-28 | 1984-09-28 | Conducting or catalysing a chemical reaction on a surface especially electroless metal deposition and catalyst systems used therein |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60175549A JPS60175549A (ja) | 1985-09-09 |
| JPH0585219B2 true JPH0585219B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-12-06 |
Family
ID=26288277
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59202140A Granted JPS60175549A (ja) | 1983-09-28 | 1984-09-28 | 触媒方法および触媒系 |
Country Status (12)
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006150353A (ja) * | 2004-11-26 | 2006-06-15 | Rohm & Haas Electronic Materials Llc | Uv硬化性触媒組成物 |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4652311A (en) * | 1984-05-07 | 1987-03-24 | Shipley Company Inc. | Catalytic metal of reduced particle size |
| US4634468A (en) * | 1984-05-07 | 1987-01-06 | Shipley Company Inc. | Catalytic metal of reduced particle size |
| US4701351A (en) * | 1986-06-16 | 1987-10-20 | International Business Machines Corporation | Seeding process for electroless metal deposition |
| IT1232841B (it) * | 1989-02-03 | 1992-03-05 | Kemifar Spa | Composizione attivante per la metallizzazione di substrati isolanti e procedimento di metalizzazione di tali substrati impiegante la stessa |
| JPH06279602A (ja) * | 1993-03-26 | 1994-10-04 | Idemitsu Petrochem Co Ltd | 無電解めっき可能なポリオレフィン樹脂成形体 |
| BE1007610A3 (nl) * | 1993-10-11 | 1995-08-22 | Philips Electronics Nv | Werkwijze voor het stroomloos aanbrengen van een metaalpatroon op een elektrisch isolerend substraat. |
| JP3022226B2 (ja) * | 1994-12-08 | 2000-03-15 | 大伸化学株式会社 | 無電解めっき法における触媒化方法 |
| JP5117656B2 (ja) * | 2001-09-28 | 2013-01-16 | セーレン株式会社 | 無電解メッキの前処理方法及びそれを用いてなる導電性材料 |
| EP1464394B1 (en) * | 2003-03-31 | 2007-09-05 | Council of Scientific and Industrial Research | Supported nanopalladium catalyst for C-C coupling reactions of haloarenes |
| JP5095909B2 (ja) * | 2003-06-24 | 2012-12-12 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | 触媒組成物および析出方法 |
| JP2005206905A (ja) * | 2004-01-23 | 2005-08-04 | Ebara Corp | 基板処理方法及び装置、並びに処理液 |
| EP2610365B1 (en) * | 2011-12-31 | 2020-02-26 | Rohm and Haas Electronic Materials LLC | Electroless plating method |
| EP2610366A3 (en) * | 2011-12-31 | 2014-07-30 | Rohm and Haas Electronic Materials LLC | Plating catalyst and method |
| JP7573322B1 (ja) * | 2023-10-30 | 2024-10-25 | 奥野製薬工業株式会社 | 無電解めっき用触媒付与液、触媒付与方法、及び、無電解めっき方法 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1543792A (fr) * | 1966-12-29 | 1900-01-01 | Ibm | Métallisation de matières plastiques |
| BE755520A (fr) * | 1969-09-01 | 1971-02-01 | Dynamit Nobel Ag | Procede de metallisation de matieres synthetiques |
| DE2111136A1 (de) * | 1971-03-09 | 1972-09-28 | Kalle Ag | Verfahren zur Herstellung von metallisierten Formkoerpern aus makromolekularem Material |
| GB1403197A (en) * | 1971-09-30 | 1975-08-28 | Bell & Howell Co | Metal encapsulation |
| US3900320A (en) * | 1971-09-30 | 1975-08-19 | Bell & Howell Co | Activation method for electroless plating |
| NL7413977A (nl) * | 1974-10-25 | 1976-04-27 | Philips Nv | Aanbrengen van een geleiderlaagpatroon met op een geringe onderlinge afstand gelegen delen, in het bijzonder bij de vervaardiging van half- geleiderinrichtingen. |
| DE2531769C3 (de) * | 1975-07-16 | 1978-07-06 | Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler, 6000 Frankfurt | Verwendung von hochstabilen Metalloxid-Dispersionen zur Erzeugung haftfester Metalloxid-Überzüge auf einem festen chemisch ineiten porösen Katalysatorträger |
| GB1573241A (en) * | 1977-03-08 | 1980-08-20 | Western Electric Co | Method of depositing a metal on a surface |
| US4073981A (en) * | 1977-03-11 | 1978-02-14 | Western Electric Company, Inc. | Method of selectively depositing metal on a surface |
| JPS5586533A (en) * | 1978-12-26 | 1980-06-30 | Toa Nenryo Kogyo Kk | Manufacturing method of granular catalyst coated with polymer |
| US4259409A (en) * | 1980-03-06 | 1981-03-31 | Ses, Incorporated | Electroless plating process for glass or ceramic bodies and product |
| DK427780A (da) * | 1980-10-10 | 1982-04-11 | Neselco As | Pulver til brug ved toer sensibilisering for stroemloes metallisering |
| DE3150985A1 (de) * | 1981-12-23 | 1983-06-30 | Bayer Ag, 5090 Leverkusen | Verfahren zur aktivierung von substratoberflaechen fuer die stromlose metallisierung |
| DK153572C (da) * | 1982-02-18 | 1988-12-19 | Platonec Aps | Pulver til brug ved toer aktivering for stroemloes metallisering, fremgangsmaade til fremstilling deraf samt anvendelse deraf |
-
1984
- 1984-09-19 PH PH31238A patent/PH23907A/en unknown
- 1984-09-26 CA CA000464009A patent/CA1233158A/en not_active Expired
- 1984-09-26 AU AU33542/84A patent/AU572564B2/en not_active Ceased
- 1984-09-27 BR BR8404858A patent/BR8404858A/pt not_active IP Right Cessation
- 1984-09-28 DE DE8484306615T patent/DE3481067D1/de not_active Expired - Fee Related
- 1984-09-28 KR KR1019840006021A patent/KR910009982B1/ko not_active Expired
- 1984-09-28 EP EP84306615A patent/EP0141528B1/en not_active Expired - Lifetime
- 1984-09-28 JP JP59202140A patent/JPS60175549A/ja active Granted
- 1984-09-28 GB GB08424618A patent/GB2164954A/en not_active Withdrawn
- 1984-09-28 ZA ZA847657A patent/ZA847657B/xx unknown
- 1984-10-04 IL IL73170A patent/IL73170A/xx not_active IP Right Cessation
-
1990
- 1990-09-27 SG SG790/90A patent/SG79090G/en unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006150353A (ja) * | 2004-11-26 | 2006-06-15 | Rohm & Haas Electronic Materials Llc | Uv硬化性触媒組成物 |
Also Published As
| Publication number | Publication date |
|---|---|
| BR8404858A (pt) | 1985-08-13 |
| KR910009982B1 (ko) | 1991-12-09 |
| EP0141528A2 (en) | 1985-05-15 |
| EP0141528A3 (en) | 1987-06-03 |
| KR850002846A (ko) | 1985-05-20 |
| CA1233158A (en) | 1988-02-23 |
| IL73170A0 (en) | 1985-01-31 |
| GB2164954A (en) | 1986-04-03 |
| GB8424618D0 (en) | 1984-11-07 |
| AU572564B2 (en) | 1988-05-12 |
| SG79090G (en) | 1990-11-23 |
| ZA847657B (en) | 1985-11-27 |
| EP0141528B1 (en) | 1990-01-17 |
| PH23907A (en) | 1989-12-18 |
| JPS60175549A (ja) | 1985-09-09 |
| DE3481067D1 (de) | 1990-02-22 |
| AU3354284A (en) | 1985-04-04 |
| IL73170A (en) | 1988-07-31 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4719145A (en) | Catalytic process and systems | |
| US4888209A (en) | Catalytic process and systems | |
| JPH0585219B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
| CA1081405A (en) | Electroless plating | |
| US5203911A (en) | Controlled electroless plating | |
| US4652311A (en) | Catalytic metal of reduced particle size | |
| US4634468A (en) | Catalytic metal of reduced particle size | |
| US5147692A (en) | Electroless plating of nickel onto surfaces such as copper or fused tungston | |
| US4725314A (en) | Catalytic metal of reduced particle size | |
| CN104903492B (zh) | 化学镀用催化剂、使用其的金属皮膜以及其制造方法 | |
| US20140065411A1 (en) | Uv curable catalyst compositions | |
| US4136216A (en) | Non-precious metal colloidal dispersions for electroless metal deposition | |
| TWI419996B (zh) | Conductive electroless plating powder and its manufacturing method | |
| US4563371A (en) | Process for preparing metallized porous solid bodies | |
| JPH04231475A (ja) | 新規金属促進剤 | |
| US6291025B1 (en) | Electroless coatings formed from organic liquids | |
| US4321285A (en) | Electroless plating | |
| JPH0613753B2 (ja) | 無電解メッキに使用する微細な金属体を含む溶液の製造方法 | |
| US4261747A (en) | Dispersions for activating non-conductors for electroless plating | |
| EP0163089B1 (en) | Process for activating a substrate for electroless deposition of a conductive metal | |
| US4132832A (en) | Method of applying dispersions for activating non-conductors for electroless plating and article | |
| JP7204195B2 (ja) | めっき下地剤およびそれを用いた積層体 | |
| JP2007194210A (ja) | 導電性微粒子及び異方性導電材料 | |
| JPS6096548A (ja) | 導電性材料 | |
| US6063445A (en) | Method of preparation of polymer substrates for metal plating |