JPH0582969B2 - - Google Patents

Info

Publication number
JPH0582969B2
JPH0582969B2 JP61152388A JP15238886A JPH0582969B2 JP H0582969 B2 JPH0582969 B2 JP H0582969B2 JP 61152388 A JP61152388 A JP 61152388A JP 15238886 A JP15238886 A JP 15238886A JP H0582969 B2 JPH0582969 B2 JP H0582969B2
Authority
JP
Japan
Prior art keywords
semiconductor
film
insulating film
semiconductor device
electrode structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61152388A
Other languages
English (en)
Japanese (ja)
Other versions
JPS637649A (ja
Inventor
Hiroyuki Fujisada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP61152388A priority Critical patent/JPS637649A/ja
Publication of JPS637649A publication Critical patent/JPS637649A/ja
Publication of JPH0582969B2 publication Critical patent/JPH0582969B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area

Landscapes

  • Local Oxidation Of Silicon (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP61152388A 1986-06-28 1986-06-28 半導体素子の電極構造 Granted JPS637649A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61152388A JPS637649A (ja) 1986-06-28 1986-06-28 半導体素子の電極構造

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61152388A JPS637649A (ja) 1986-06-28 1986-06-28 半導体素子の電極構造

Publications (2)

Publication Number Publication Date
JPS637649A JPS637649A (ja) 1988-01-13
JPH0582969B2 true JPH0582969B2 (enrdf_load_stackoverflow) 1993-11-24

Family

ID=15539424

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61152388A Granted JPS637649A (ja) 1986-06-28 1986-06-28 半導体素子の電極構造

Country Status (1)

Country Link
JP (1) JPS637649A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010177248A (ja) * 2009-01-27 2010-08-12 Anritsu Corp 半導体装置及びその製造方法

Also Published As

Publication number Publication date
JPS637649A (ja) 1988-01-13

Similar Documents

Publication Publication Date Title
US12255168B2 (en) Electronic device with multi-layer contact and system
US4772935A (en) Die bonding process
JP3126977B2 (ja) 補強された直接結合銅構造体
JP4383882B2 (ja) 素子の気密カプセル化方法
US9852940B2 (en) Method for forming a reliable solderable contact
JPH0582991B2 (enrdf_load_stackoverflow)
CN100481425C (zh) 带有铝电极和金属化电极的半导体器件
JPH0799169A (ja) 炭化けい素電子デバイスの製造方法
US6191485B1 (en) Semiconductor device
JPH0582969B2 (enrdf_load_stackoverflow)
US6060771A (en) Connecting lead for semiconductor devices and method for fabricating the lead
JPH0193149A (ja) 半導体装置
US4921158A (en) Brazing material
JPH0864801A (ja) 炭化けい素半導体素子およびその製造方法
JPS60193337A (ja) 半導体装置の製造方法
JPS6220338A (ja) 半導体装置の製造方法
JPS5873136A (ja) 半導体デバイスの製造方法
JP2742686B2 (ja) 半導体装置
JPS60167352A (ja) 半導体素子
JPH02140955A (ja) 半導体装置
JPH0555296A (ja) 半導体装置
JPS63318139A (ja) 金属薄膜配線
JPS6329437B2 (enrdf_load_stackoverflow)
JPS59161885A (ja) ホ−ル素子
JPH0258880A (ja) 半導体磁気抵抗素子

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term