JPH0582933B2 - - Google Patents
Info
- Publication number
- JPH0582933B2 JPH0582933B2 JP10174587A JP10174587A JPH0582933B2 JP H0582933 B2 JPH0582933 B2 JP H0582933B2 JP 10174587 A JP10174587 A JP 10174587A JP 10174587 A JP10174587 A JP 10174587A JP H0582933 B2 JPH0582933 B2 JP H0582933B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- sample
- aperture
- foreign matter
- foreign
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005286 illumination Methods 0.000 claims description 42
- 238000007689 inspection Methods 0.000 claims description 29
- 238000001514 detection method Methods 0.000 claims description 28
- 230000009467 reduction Effects 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 17
- 238000003384 imaging method Methods 0.000 claims description 11
- 238000012545 processing Methods 0.000 claims description 11
- 239000000126 substance Substances 0.000 claims description 7
- 230000008569 process Effects 0.000 claims description 6
- 230000004907 flux Effects 0.000 claims description 3
- 230000005540 biological transmission Effects 0.000 claims description 2
- 230000000903 blocking effect Effects 0.000 claims 1
- 239000000523 sample Substances 0.000 description 19
- 230000007547 defect Effects 0.000 description 14
- 230000003287 optical effect Effects 0.000 description 11
- 230000006378 damage Effects 0.000 description 10
- 230000006870 function Effects 0.000 description 8
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 7
- 238000010586 diagram Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 238000012546 transfer Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004556 laser interferometry Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62101745A JPS63268245A (ja) | 1987-04-27 | 1987-04-27 | 異物検査方法およびその装置 |
| US07/184,787 US4952058A (en) | 1987-04-27 | 1988-04-22 | Method and apparatus for detecting abnormal patterns |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62101745A JPS63268245A (ja) | 1987-04-27 | 1987-04-27 | 異物検査方法およびその装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63268245A JPS63268245A (ja) | 1988-11-04 |
| JPH0582933B2 true JPH0582933B2 (enrdf_load_stackoverflow) | 1993-11-24 |
Family
ID=14308782
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62101745A Granted JPS63268245A (ja) | 1987-04-27 | 1987-04-27 | 異物検査方法およびその装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63268245A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0498149A (ja) * | 1990-08-15 | 1992-03-30 | Nec Corp | 欠陥検査装置 |
-
1987
- 1987-04-27 JP JP62101745A patent/JPS63268245A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63268245A (ja) | 1988-11-04 |
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