JPH0582729B2 - - Google Patents
Info
- Publication number
- JPH0582729B2 JPH0582729B2 JP59237532A JP23753284A JPH0582729B2 JP H0582729 B2 JPH0582729 B2 JP H0582729B2 JP 59237532 A JP59237532 A JP 59237532A JP 23753284 A JP23753284 A JP 23753284A JP H0582729 B2 JPH0582729 B2 JP H0582729B2
- Authority
- JP
- Japan
- Prior art keywords
- gap
- diffraction grating
- light
- mark
- positional deviation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001514 detection method Methods 0.000 claims description 46
- 238000000034 method Methods 0.000 claims description 7
- 230000001427 coherent effect Effects 0.000 claims description 3
- 238000006073 displacement reaction Methods 0.000 claims 1
- 239000010409 thin film Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59237532A JPS61116837A (ja) | 1984-11-13 | 1984-11-13 | 回折格子によるギヤツプ・位置合せ制御法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59237532A JPS61116837A (ja) | 1984-11-13 | 1984-11-13 | 回折格子によるギヤツプ・位置合せ制御法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61116837A JPS61116837A (ja) | 1986-06-04 |
JPH0582729B2 true JPH0582729B2 (en, 2012) | 1993-11-22 |
Family
ID=17016727
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59237532A Granted JPS61116837A (ja) | 1984-11-13 | 1984-11-13 | 回折格子によるギヤツプ・位置合せ制御法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61116837A (en, 2012) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3719538A1 (de) * | 1986-06-11 | 1987-12-17 | Toshiba Kawasaki Kk | Verfahren und vorrichtung zum einstellen eines spalts zwischen zwei objekten auf eine vorbestimmte groesse |
KR900004269B1 (ko) * | 1986-06-11 | 1990-06-18 | 가부시기가이샤 도시바 | 제 1물체와 제 2 물체와의 위치 맞추는 방법 및 장치 |
JP3197010B2 (ja) * | 1990-03-05 | 2001-08-13 | 株式会社東芝 | 間隔設定方法及び間隔設定装置 |
JP3841824B2 (ja) * | 1994-01-24 | 2006-11-08 | エスヴィージー リトグラフィー システムズ インコーポレイテッド | 格子−格子干渉型位置合わせ装置 |
-
1984
- 1984-11-13 JP JP59237532A patent/JPS61116837A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS61116837A (ja) | 1986-06-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4200395A (en) | Alignment of diffraction gratings | |
US4311389A (en) | Method for the optical alignment of designs in two near planes and alignment apparatus for performing this method | |
US4340305A (en) | Plate aligning | |
US4656347A (en) | Diffraction grating position adjuster using a grating and a reflector | |
KR900004269B1 (ko) | 제 1물체와 제 2 물체와의 위치 맞추는 방법 및 장치 | |
US5369486A (en) | Position detector for detecting the position of an object using a diffraction grating positioned at an angle | |
JPH039403B2 (en, 2012) | ||
US4988197A (en) | Method and apparatus for aligning two objects, and method and apparatus for providing a desired gap between two objects | |
EP0309281A2 (en) | Apparatus for controlling relation in position between a photomask and a wafer | |
JP3244769B2 (ja) | 測定方法及び測定装置 | |
JPH0582729B2 (en, 2012) | ||
JPS5938521B2 (ja) | 微小変位測定および位置合わせ装置 | |
JPH083404B2 (ja) | 位置合せ方法 | |
US4808807A (en) | Optical focus sensor system | |
JPH0663739B2 (ja) | 回折格子による位置検出方法および位置検出装置 | |
JP2578742B2 (ja) | 位置合わせ方法 | |
JPS60173837A (ja) | 組合せ回折格子によるギヤツプ・位置合せ制御法 | |
JPS6227730B2 (en, 2012) | ||
JPH0441485B2 (en, 2012) | ||
JP2554626B2 (ja) | 回折格子による位置合わせ方法および位置合わせ装置 | |
JP2677662B2 (ja) | 相対位置合せ方法および装置 | |
JP2885454B2 (ja) | 相対位置合せ方法及び装置 | |
JP2694045B2 (ja) | 回折格子を用いた位置合せ装置 | |
JPH0460331B2 (en, 2012) | ||
JPH0587527A (ja) | 光ヘテロダイン干渉計測方法及び計測装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |