JPH058270B2 - - Google Patents

Info

Publication number
JPH058270B2
JPH058270B2 JP59246854A JP24685484A JPH058270B2 JP H058270 B2 JPH058270 B2 JP H058270B2 JP 59246854 A JP59246854 A JP 59246854A JP 24685484 A JP24685484 A JP 24685484A JP H058270 B2 JPH058270 B2 JP H058270B2
Authority
JP
Japan
Prior art keywords
support
base material
vapor deposition
deposited
silicon carbide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59246854A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61124572A (ja
Inventor
Yasuhiro Aiba
Keizo Hirai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP24685484A priority Critical patent/JPS61124572A/ja
Publication of JPS61124572A publication Critical patent/JPS61124572A/ja
Publication of JPH058270B2 publication Critical patent/JPH058270B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C23C16/325—Silicon carbide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4581—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP24685484A 1984-11-21 1984-11-21 化学蒸着方法 Granted JPS61124572A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24685484A JPS61124572A (ja) 1984-11-21 1984-11-21 化学蒸着方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24685484A JPS61124572A (ja) 1984-11-21 1984-11-21 化学蒸着方法

Publications (2)

Publication Number Publication Date
JPS61124572A JPS61124572A (ja) 1986-06-12
JPH058270B2 true JPH058270B2 (enrdf_load_stackoverflow) 1993-02-01

Family

ID=17154700

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24685484A Granted JPS61124572A (ja) 1984-11-21 1984-11-21 化学蒸着方法

Country Status (1)

Country Link
JP (1) JPS61124572A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH081444U (ja) * 1996-03-28 1996-10-01 株式会社ゼクセル 熱交換器のブラケット構造
JPH081443U (ja) * 1996-03-28 1996-10-01 株式会社ゼクセル 熱交換器におけるブラケットの取付け構造

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0669640A1 (en) * 1994-02-25 1995-08-30 Applied Materials, Inc. Susceptor for deposition apparatus
JP4970115B2 (ja) * 2007-04-06 2012-07-04 株式会社神戸製鋼所 導電性ダイヤモンド被覆網状電極、その製造方法及び同電極を備えたオゾン水生成装置
JP5278851B2 (ja) * 2008-10-23 2013-09-04 東洋炭素株式会社 炭素基材表面への炭化珪素膜の形成方法
JP5787558B2 (ja) * 2011-03-08 2015-09-30 イビデン株式会社 セラミックス基材支持具及びセラミックス部材の製造方法
JP6383588B2 (ja) * 2014-06-30 2018-08-29 イビデン株式会社 セラミック部材の製造方法および支持具
JP6506056B2 (ja) * 2015-03-13 2019-04-24 イビデン株式会社 セラミック部材の製造方法
JP7321768B2 (ja) 2018-05-23 2023-08-07 信越化学工業株式会社 化学気相成長装置および被膜形成方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS512177Y2 (enrdf_load_stackoverflow) * 1971-04-08 1976-01-22

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH081444U (ja) * 1996-03-28 1996-10-01 株式会社ゼクセル 熱交換器のブラケット構造
JPH081443U (ja) * 1996-03-28 1996-10-01 株式会社ゼクセル 熱交換器におけるブラケットの取付け構造

Also Published As

Publication number Publication date
JPS61124572A (ja) 1986-06-12

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