JPH0582068B2 - - Google Patents
Info
- Publication number
- JPH0582068B2 JPH0582068B2 JP58025706A JP2570683A JPH0582068B2 JP H0582068 B2 JPH0582068 B2 JP H0582068B2 JP 58025706 A JP58025706 A JP 58025706A JP 2570683 A JP2570683 A JP 2570683A JP H0582068 B2 JPH0582068 B2 JP H0582068B2
- Authority
- JP
- Japan
- Prior art keywords
- region
- protection circuit
- drain
- oxide film
- type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/60—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
- H10D89/601—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs
Landscapes
- Semiconductor Integrated Circuits (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58025706A JPS59151469A (ja) | 1983-02-18 | 1983-02-18 | 保護回路素子 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58025706A JPS59151469A (ja) | 1983-02-18 | 1983-02-18 | 保護回路素子 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59151469A JPS59151469A (ja) | 1984-08-29 |
JPH0582068B2 true JPH0582068B2 (enrdf_load_stackoverflow) | 1993-11-17 |
Family
ID=12173224
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58025706A Granted JPS59151469A (ja) | 1983-02-18 | 1983-02-18 | 保護回路素子 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59151469A (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5296450B2 (ja) * | 2008-08-13 | 2013-09-25 | セイコーインスツル株式会社 | 半導体装置 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5837969A (ja) * | 1981-08-31 | 1983-03-05 | Fujitsu Ltd | 保護回路素子 |
-
1983
- 1983-02-18 JP JP58025706A patent/JPS59151469A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59151469A (ja) | 1984-08-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6518623B1 (en) | Semiconductor device having a buried-channel MOS structure | |
EP0387999B1 (en) | Process for forming high-voltage and low-voltage CMOS transistors on a single integrated circuit chip | |
US6194763B1 (en) | Semiconductor device having SOI-MOSFET | |
EP0164449A2 (en) | Process for producing a semiconductor integrated circuit device including a MISFET | |
KR900003257B1 (ko) | 보호회로를 갖는 반도체장치 | |
US10181440B2 (en) | Semiconductor device | |
US4853340A (en) | Semiconductor device isolated by a pair of field oxide regions | |
JPS6124833B2 (enrdf_load_stackoverflow) | ||
US5242849A (en) | Method for the fabrication of MOS devices | |
US4517731A (en) | Double polysilicon process for fabricating CMOS integrated circuits | |
JPS6035558A (ja) | 半導体集積回路装置およびその製造方法 | |
JPH0582068B2 (enrdf_load_stackoverflow) | ||
JP3186298B2 (ja) | Mos型半導体素子の製造方法 | |
JPH0475387A (ja) | Mis型半導体装置 | |
JPH0430194B2 (enrdf_load_stackoverflow) | ||
JP3424146B2 (ja) | 半導体装置およびその製造方法 | |
JPH06252345A (ja) | 半導体集積回路の製造方法 | |
US4528581A (en) | High density CMOS devices with conductively interconnected wells | |
JPH0575041A (ja) | Cmos半導体装置 | |
JP3114613B2 (ja) | 半導体装置およびその製造方法 | |
KR100323447B1 (ko) | 모스전계효과트랜지스터의제조방법 | |
EP0112662A1 (en) | Stacked MOS devices with polysilicon interconnects | |
KR910009743B1 (ko) | 고속 및 고전압 반도체소자와 제조방법 | |
JPS6369271A (ja) | 半導体装置及びその製造方法 | |
JPS61203679A (ja) | 高耐圧mosトランジスタ |