JPH0582067B2 - - Google Patents
Info
- Publication number
- JPH0582067B2 JPH0582067B2 JP58025054A JP2505483A JPH0582067B2 JP H0582067 B2 JPH0582067 B2 JP H0582067B2 JP 58025054 A JP58025054 A JP 58025054A JP 2505483 A JP2505483 A JP 2505483A JP H0582067 B2 JPH0582067 B2 JP H0582067B2
- Authority
- JP
- Japan
- Prior art keywords
- impurity concentration
- gate
- layer
- region
- transistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58025054A JPS59151464A (ja) | 1983-02-17 | 1983-02-17 | Misトランジスタ及びその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58025054A JPS59151464A (ja) | 1983-02-17 | 1983-02-17 | Misトランジスタ及びその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59151464A JPS59151464A (ja) | 1984-08-29 |
| JPH0582067B2 true JPH0582067B2 (enExample) | 1993-11-17 |
Family
ID=12155204
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58025054A Granted JPS59151464A (ja) | 1983-02-17 | 1983-02-17 | Misトランジスタ及びその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59151464A (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0691248B2 (ja) * | 1984-07-25 | 1994-11-14 | 株式会社日立製作所 | 半導体装置の製造方法 |
| JPH0638497B2 (ja) * | 1986-01-13 | 1994-05-18 | 株式会社日立製作所 | 半導体装置の製造方法 |
| JPS62219966A (ja) * | 1986-03-22 | 1987-09-28 | Toshiba Corp | 半導体装置 |
| JPS63122177A (ja) * | 1986-11-11 | 1988-05-26 | Nippon Telegr & Teleph Corp <Ntt> | 半導体装置とその製造方法 |
| JPS63169065A (ja) * | 1987-01-05 | 1988-07-13 | Seiko Instr & Electronics Ltd | 絶縁ゲ−ト電界効果トランジスタ |
| JPS63177470A (ja) * | 1987-01-16 | 1988-07-21 | Seiko Instr & Electronics Ltd | 絶縁ゲ−ト電界効果トランジスタの製造方法 |
| JP2633547B2 (ja) * | 1987-02-21 | 1997-07-23 | 株式会社東芝 | 半導体記憶装置およびその製造方法 |
| JP2660446B2 (ja) * | 1990-01-12 | 1997-10-08 | 三菱電機株式会社 | 微小なmis型fetとその製造方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51114074A (en) * | 1975-03-31 | 1976-10-07 | Sony Corp | Insulation gate type field effect transistor |
| JPS5321562A (en) * | 1976-08-12 | 1978-02-28 | Nec Corp | Signal switch |
-
1983
- 1983-02-17 JP JP58025054A patent/JPS59151464A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59151464A (ja) | 1984-08-29 |
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