JPH057863B2 - - Google Patents

Info

Publication number
JPH057863B2
JPH057863B2 JP60212877A JP21287785A JPH057863B2 JP H057863 B2 JPH057863 B2 JP H057863B2 JP 60212877 A JP60212877 A JP 60212877A JP 21287785 A JP21287785 A JP 21287785A JP H057863 B2 JPH057863 B2 JP H057863B2
Authority
JP
Japan
Prior art keywords
etching
oxide film
silicon oxide
silicon
silicon substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60212877A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6272129A (ja
Inventor
Taiichi Ootani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP21287785A priority Critical patent/JPS6272129A/ja
Publication of JPS6272129A publication Critical patent/JPS6272129A/ja
Publication of JPH057863B2 publication Critical patent/JPH057863B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP21287785A 1985-09-26 1985-09-26 半導体装置の製造方法 Granted JPS6272129A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21287785A JPS6272129A (ja) 1985-09-26 1985-09-26 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21287785A JPS6272129A (ja) 1985-09-26 1985-09-26 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS6272129A JPS6272129A (ja) 1987-04-02
JPH057863B2 true JPH057863B2 (enrdf_load_stackoverflow) 1993-01-29

Family

ID=16629740

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21287785A Granted JPS6272129A (ja) 1985-09-26 1985-09-26 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS6272129A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04215432A (ja) * 1990-12-14 1992-08-06 Mitsubishi Electric Corp 微細加工方法
JP4665455B2 (ja) * 2004-08-09 2011-04-06 富士ゼロックス株式会社 シリコン構造体製造方法、モールド金型製造方法、成形部材製造方法、シリコン構造体、インクジェット記録ヘッド、及び、画像形成装置
JP5573306B2 (ja) * 2010-03-31 2014-08-20 凸版印刷株式会社 フォトマスクブランクの製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS558590B2 (enrdf_load_stackoverflow) * 1972-02-02 1980-03-05
JPS6025249A (ja) * 1983-07-22 1985-02-08 Pioneer Electronic Corp 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS6272129A (ja) 1987-04-02

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