JPS6272129A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS6272129A
JPS6272129A JP21287785A JP21287785A JPS6272129A JP S6272129 A JPS6272129 A JP S6272129A JP 21287785 A JP21287785 A JP 21287785A JP 21287785 A JP21287785 A JP 21287785A JP S6272129 A JPS6272129 A JP S6272129A
Authority
JP
Japan
Prior art keywords
etching
oxide film
polycrystalline silicon
silicon layer
silicon oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21287785A
Other languages
English (en)
Japanese (ja)
Other versions
JPH057863B2 (enrdf_load_stackoverflow
Inventor
Taiichi Otani
泰一 大谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP21287785A priority Critical patent/JPS6272129A/ja
Publication of JPS6272129A publication Critical patent/JPS6272129A/ja
Publication of JPH057863B2 publication Critical patent/JPH057863B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP21287785A 1985-09-26 1985-09-26 半導体装置の製造方法 Granted JPS6272129A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21287785A JPS6272129A (ja) 1985-09-26 1985-09-26 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21287785A JPS6272129A (ja) 1985-09-26 1985-09-26 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS6272129A true JPS6272129A (ja) 1987-04-02
JPH057863B2 JPH057863B2 (enrdf_load_stackoverflow) 1993-01-29

Family

ID=16629740

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21287785A Granted JPS6272129A (ja) 1985-09-26 1985-09-26 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS6272129A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04215432A (ja) * 1990-12-14 1992-08-06 Mitsubishi Electric Corp 微細加工方法
JP2006045656A (ja) * 2004-08-09 2006-02-16 Fuji Xerox Co Ltd シリコン構造体製造方法、モールド金型製造方法、成形部材製造方法、シリコン構造体、インクジェット記録ヘッド、及び、画像形成装置
JP2011215404A (ja) * 2010-03-31 2011-10-27 Toppan Printing Co Ltd フォトマスクブランクとその製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4880440A (enrdf_load_stackoverflow) * 1972-02-02 1973-10-27
JPS6025249A (ja) * 1983-07-22 1985-02-08 Pioneer Electronic Corp 半導体装置の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4880440A (enrdf_load_stackoverflow) * 1972-02-02 1973-10-27
JPS6025249A (ja) * 1983-07-22 1985-02-08 Pioneer Electronic Corp 半導体装置の製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04215432A (ja) * 1990-12-14 1992-08-06 Mitsubishi Electric Corp 微細加工方法
JP2006045656A (ja) * 2004-08-09 2006-02-16 Fuji Xerox Co Ltd シリコン構造体製造方法、モールド金型製造方法、成形部材製造方法、シリコン構造体、インクジェット記録ヘッド、及び、画像形成装置
JP2011215404A (ja) * 2010-03-31 2011-10-27 Toppan Printing Co Ltd フォトマスクブランクとその製造方法

Also Published As

Publication number Publication date
JPH057863B2 (enrdf_load_stackoverflow) 1993-01-29

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