JPH0577299B2 - - Google Patents
Info
- Publication number
- JPH0577299B2 JPH0577299B2 JP61062452A JP6245286A JPH0577299B2 JP H0577299 B2 JPH0577299 B2 JP H0577299B2 JP 61062452 A JP61062452 A JP 61062452A JP 6245286 A JP6245286 A JP 6245286A JP H0577299 B2 JPH0577299 B2 JP H0577299B2
- Authority
- JP
- Japan
- Prior art keywords
- region
- forming
- diffusion layer
- iil
- conductivity type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/60—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
- H10D84/65—Integrated injection logic
- H10D84/658—Integrated injection logic integrated in combination with analog structures
Landscapes
- Bipolar Integrated Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61062452A JPS62219556A (ja) | 1986-03-19 | 1986-03-19 | 半導体集積回路の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61062452A JPS62219556A (ja) | 1986-03-19 | 1986-03-19 | 半導体集積回路の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62219556A JPS62219556A (ja) | 1987-09-26 |
| JPH0577299B2 true JPH0577299B2 (enrdf_load_stackoverflow) | 1993-10-26 |
Family
ID=13200610
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61062452A Granted JPS62219556A (ja) | 1986-03-19 | 1986-03-19 | 半導体集積回路の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62219556A (enrdf_load_stackoverflow) |
-
1986
- 1986-03-19 JP JP61062452A patent/JPS62219556A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62219556A (ja) | 1987-09-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2557750B2 (ja) | 光半導体装置 | |
| JPH0577299B2 (enrdf_load_stackoverflow) | ||
| JPH0577294B2 (enrdf_load_stackoverflow) | ||
| JPH0577298B2 (enrdf_load_stackoverflow) | ||
| JPH0577300B2 (enrdf_load_stackoverflow) | ||
| JPH0577301B2 (enrdf_load_stackoverflow) | ||
| JP2627289B2 (ja) | 半導体集積回路の製造方法 | |
| JPH0577295B2 (enrdf_load_stackoverflow) | ||
| JPH0727969B2 (ja) | 半導体集積回路の製造方法 | |
| JPH0577297B2 (enrdf_load_stackoverflow) | ||
| JP2517237B2 (ja) | 半導体集積回路の製造方法 | |
| JPH0439787B2 (enrdf_load_stackoverflow) | ||
| JPS6347965A (ja) | 半導体集積回路 | |
| JP3135615B2 (ja) | 半導体装置及びその製造方法 | |
| JP2656125B2 (ja) | 半導体集積回路の製造方法 | |
| JP2506129B2 (ja) | 半導体装置の製造方法 | |
| KR100194654B1 (ko) | 반도체장치 및 그의 제조방법 | |
| JPS63136660A (ja) | 半導体装置とその製造法 | |
| JPH0727970B2 (ja) | 半導体集積回路の製造方法 | |
| JPS62295449A (ja) | 半導体注入集積論理回路 | |
| JPS632366A (ja) | 半導体集積回路 | |
| JPH0451067B2 (enrdf_load_stackoverflow) | ||
| JPS62193142A (ja) | 半導体集積回路装置の製造方法 | |
| JPS62295450A (ja) | 半導体集積回路 | |
| JPS60211978A (ja) | 半導体装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |