JPH0577297B2 - - Google Patents
Info
- Publication number
- JPH0577297B2 JPH0577297B2 JP61060014A JP6001486A JPH0577297B2 JP H0577297 B2 JPH0577297 B2 JP H0577297B2 JP 61060014 A JP61060014 A JP 61060014A JP 6001486 A JP6001486 A JP 6001486A JP H0577297 B2 JPH0577297 B2 JP H0577297B2
- Authority
- JP
- Japan
- Prior art keywords
- diffusion layer
- layer
- conductivity type
- impurity
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/60—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
- H10D84/65—Integrated injection logic
Landscapes
- Bipolar Integrated Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61060014A JPS62216355A (ja) | 1986-03-18 | 1986-03-18 | 半導体注入集積論理回路装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61060014A JPS62216355A (ja) | 1986-03-18 | 1986-03-18 | 半導体注入集積論理回路装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62216355A JPS62216355A (ja) | 1987-09-22 |
| JPH0577297B2 true JPH0577297B2 (enrdf_load_stackoverflow) | 1993-10-26 |
Family
ID=13129787
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61060014A Granted JPS62216355A (ja) | 1986-03-18 | 1986-03-18 | 半導体注入集積論理回路装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62216355A (enrdf_load_stackoverflow) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5350686A (en) * | 1976-10-19 | 1978-05-09 | Mitsubishi Electric Corp | Production of semiconductor integrated circuit |
| JPS59979B2 (ja) * | 1976-12-29 | 1984-01-10 | 富士通株式会社 | 半導体集積回路 |
-
1986
- 1986-03-18 JP JP61060014A patent/JPS62216355A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62216355A (ja) | 1987-09-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2950577B2 (ja) | BiCMOS半導体集積回路の製造方法 | |
| KR0171128B1 (ko) | 수직형 바이폴라 트랜지스터 | |
| JPH0577297B2 (enrdf_load_stackoverflow) | ||
| JPH02283028A (ja) | 半導体装置及びその製造方法 | |
| JPH0577294B2 (enrdf_load_stackoverflow) | ||
| JP2890509B2 (ja) | 半導体装置の製造方法 | |
| JPH0577298B2 (enrdf_load_stackoverflow) | ||
| JPH0577301B2 (enrdf_load_stackoverflow) | ||
| JPH0618203B2 (ja) | 縦型pnpトランジスタの製造方法 | |
| JP2615707B2 (ja) | 半導体装置の製造方法 | |
| JP2627289B2 (ja) | 半導体集積回路の製造方法 | |
| JPH0577300B2 (enrdf_load_stackoverflow) | ||
| JPS62219556A (ja) | 半導体集積回路の製造方法 | |
| JPH0439787B2 (enrdf_load_stackoverflow) | ||
| JP2506129B2 (ja) | 半導体装置の製造方法 | |
| JP2656125B2 (ja) | 半導体集積回路の製造方法 | |
| KR100194654B1 (ko) | 반도체장치 및 그의 제조방법 | |
| JPH0451526A (ja) | 半導体装置およびその製造方法 | |
| JPH0577295B2 (enrdf_load_stackoverflow) | ||
| JPH05308077A (ja) | バイポーラ型半導体装置およびその製造方法 | |
| JPH025429A (ja) | 横型pnpトランジスタの製造方法 | |
| JPS62193143A (ja) | 半導体集積回路装置の製造方法 | |
| JPH0451067B2 (enrdf_load_stackoverflow) | ||
| JPS58100457A (ja) | 半導体装置 | |
| JPH0439789B2 (enrdf_load_stackoverflow) |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |