JPH0577297B2 - - Google Patents

Info

Publication number
JPH0577297B2
JPH0577297B2 JP61060014A JP6001486A JPH0577297B2 JP H0577297 B2 JPH0577297 B2 JP H0577297B2 JP 61060014 A JP61060014 A JP 61060014A JP 6001486 A JP6001486 A JP 6001486A JP H0577297 B2 JPH0577297 B2 JP H0577297B2
Authority
JP
Japan
Prior art keywords
diffusion layer
layer
conductivity type
impurity
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61060014A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62216355A (ja
Inventor
Teruo Tabata
Toshuki Ookoda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP61060014A priority Critical patent/JPS62216355A/ja
Publication of JPS62216355A publication Critical patent/JPS62216355A/ja
Publication of JPH0577297B2 publication Critical patent/JPH0577297B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/60Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
    • H10D84/65Integrated injection logic

Landscapes

  • Bipolar Integrated Circuits (AREA)
JP61060014A 1986-03-18 1986-03-18 半導体注入集積論理回路装置の製造方法 Granted JPS62216355A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61060014A JPS62216355A (ja) 1986-03-18 1986-03-18 半導体注入集積論理回路装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61060014A JPS62216355A (ja) 1986-03-18 1986-03-18 半導体注入集積論理回路装置の製造方法

Publications (2)

Publication Number Publication Date
JPS62216355A JPS62216355A (ja) 1987-09-22
JPH0577297B2 true JPH0577297B2 (enrdf_load_stackoverflow) 1993-10-26

Family

ID=13129787

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61060014A Granted JPS62216355A (ja) 1986-03-18 1986-03-18 半導体注入集積論理回路装置の製造方法

Country Status (1)

Country Link
JP (1) JPS62216355A (enrdf_load_stackoverflow)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5350686A (en) * 1976-10-19 1978-05-09 Mitsubishi Electric Corp Production of semiconductor integrated circuit
JPS59979B2 (ja) * 1976-12-29 1984-01-10 富士通株式会社 半導体集積回路

Also Published As

Publication number Publication date
JPS62216355A (ja) 1987-09-22

Similar Documents

Publication Publication Date Title
JP2950577B2 (ja) BiCMOS半導体集積回路の製造方法
KR0171128B1 (ko) 수직형 바이폴라 트랜지스터
JPH0577297B2 (enrdf_load_stackoverflow)
JPH02283028A (ja) 半導体装置及びその製造方法
JPH0577294B2 (enrdf_load_stackoverflow)
JP2890509B2 (ja) 半導体装置の製造方法
JPH0577298B2 (enrdf_load_stackoverflow)
JPH0577301B2 (enrdf_load_stackoverflow)
JPH0618203B2 (ja) 縦型pnpトランジスタの製造方法
JP2615707B2 (ja) 半導体装置の製造方法
JP2627289B2 (ja) 半導体集積回路の製造方法
JPH0577300B2 (enrdf_load_stackoverflow)
JPS62219556A (ja) 半導体集積回路の製造方法
JPH0439787B2 (enrdf_load_stackoverflow)
JP2506129B2 (ja) 半導体装置の製造方法
JP2656125B2 (ja) 半導体集積回路の製造方法
KR100194654B1 (ko) 반도체장치 및 그의 제조방법
JPH0451526A (ja) 半導体装置およびその製造方法
JPH0577295B2 (enrdf_load_stackoverflow)
JPH05308077A (ja) バイポーラ型半導体装置およびその製造方法
JPH025429A (ja) 横型pnpトランジスタの製造方法
JPS62193143A (ja) 半導体集積回路装置の製造方法
JPH0451067B2 (enrdf_load_stackoverflow)
JPS58100457A (ja) 半導体装置
JPH0439789B2 (enrdf_load_stackoverflow)

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term