JPH0545051B2 - - Google Patents

Info

Publication number
JPH0545051B2
JPH0545051B2 JP62003963A JP396387A JPH0545051B2 JP H0545051 B2 JPH0545051 B2 JP H0545051B2 JP 62003963 A JP62003963 A JP 62003963A JP 396387 A JP396387 A JP 396387A JP H0545051 B2 JPH0545051 B2 JP H0545051B2
Authority
JP
Japan
Prior art keywords
laser
optical system
mask
bundle
laser beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP62003963A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63173322A (ja
Inventor
Akira Ono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP62003963A priority Critical patent/JPS63173322A/ja
Publication of JPS63173322A publication Critical patent/JPS63173322A/ja
Publication of JPH0545051B2 publication Critical patent/JPH0545051B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Laser Beam Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP62003963A 1987-01-13 1987-01-13 半導体露光装置 Granted JPS63173322A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62003963A JPS63173322A (ja) 1987-01-13 1987-01-13 半導体露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62003963A JPS63173322A (ja) 1987-01-13 1987-01-13 半導体露光装置

Publications (2)

Publication Number Publication Date
JPS63173322A JPS63173322A (ja) 1988-07-16
JPH0545051B2 true JPH0545051B2 (enrdf_load_stackoverflow) 1993-07-08

Family

ID=11571736

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62003963A Granted JPS63173322A (ja) 1987-01-13 1987-01-13 半導体露光装置

Country Status (1)

Country Link
JP (1) JPS63173322A (enrdf_load_stackoverflow)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2755349B2 (ja) * 1987-09-17 1998-05-20 オリンパス光学工業株式会社 半導体露光装置の照明光学系
JPH0627276Y2 (ja) * 1988-04-19 1994-07-27 宮地電子株式会社 レーザ出射装置
JP2526986B2 (ja) * 1988-05-18 1996-08-21 株式会社ニコン 照明装置
JP2732498B2 (ja) * 1988-11-24 1998-03-30 株式会社日立製作所 縮小投影式露光方法及びその装置
JPH07308788A (ja) * 1994-05-16 1995-11-28 Sanyo Electric Co Ltd 光加工法及び光起電力装置の製造方法
JPH0947889A (ja) * 1995-08-02 1997-02-18 Komatsu Ltd レーザマーカ
JP4309752B2 (ja) * 1997-06-27 2009-08-05 株式会社東芝 フォトマスク検査方法、フォトマスク検査装置及びフォトマスク製造方法
US6849363B2 (en) 1997-06-27 2005-02-01 Kabushiki Kaisha Toshiba Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device
JP4309751B2 (ja) * 1997-06-27 2009-08-05 株式会社東芝 フォトマスク修復方法
JPH1172905A (ja) * 1997-06-27 1999-03-16 Toshiba Corp フォトマスク修復方法、検査方法、検査装置及びフォトマスク製造方法
JP2003039189A (ja) * 2001-07-27 2003-02-12 Hamamatsu Photonics Kk レーザ光照射装置及び表面処理方法
JP2003130802A (ja) * 2001-10-26 2003-05-08 Nippon Steel Corp 疵検査装置及び疵検査方法
JP4112355B2 (ja) * 2002-12-11 2008-07-02 日立造船株式会社 ビーム成形方法及び装置
JP2006522938A (ja) * 2003-03-31 2006-10-05 ゾロ テクノロジーズ，インコーポレイティド 燃焼の監視および制御のための方法と装置
JP4444984B2 (ja) 2007-04-18 2010-03-31 アドバンスド・マスク・インスペクション・テクノロジー株式会社 レチクル欠陥検査装置およびこれを用いた検査方法
DE102011004375B3 (de) * 2011-02-18 2012-05-31 Carl Zeiss Smt Gmbh Vorrichtung zur Führung von elektromagnetischer Strahlung in eine Projektionsbelichtungsanlage
JP5740190B2 (ja) * 2011-03-28 2015-06-24 ギガフォトン株式会社 レーザシステムおよびレーザ生成方法
JP6345431B2 (ja) * 2014-02-03 2018-06-20 株式会社ニューフレアテクノロジー 照明装置及びパターン検査装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4831969A (enrdf_load_stackoverflow) * 1971-08-27 1973-04-26
FR2406236A1 (fr) * 1976-12-10 1979-05-11 Thomson Csf Dispositif optique a source coherente pour le transfert rapide de motifs sur substrats, applique a la realisation de composants et circuits a microstructures
JPS54111832A (en) * 1978-02-22 1979-09-01 Hitachi Ltd Exposure device
DE3318978A1 (de) * 1983-05-25 1984-11-29 Werner Dr. Vaduz Tabarelli Einrichtung zum projektionskopieren von masken auf ein werkstueck
JPS61279822A (ja) * 1985-06-05 1986-12-10 Canon Inc 照明光学系
JPS6332555A (ja) * 1986-07-25 1988-02-12 Nippon Telegr & Teleph Corp <Ntt> 露光装置

Also Published As

Publication number Publication date
JPS63173322A (ja) 1988-07-16

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