JPH0543792B2 - - Google Patents

Info

Publication number
JPH0543792B2
JPH0543792B2 JP2145067A JP14506790A JPH0543792B2 JP H0543792 B2 JPH0543792 B2 JP H0543792B2 JP 2145067 A JP2145067 A JP 2145067A JP 14506790 A JP14506790 A JP 14506790A JP H0543792 B2 JPH0543792 B2 JP H0543792B2
Authority
JP
Japan
Prior art keywords
magnetic field
film
substrate
electric field
space
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2145067A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0317274A (ja
Inventor
Takashi Inushima
Naoki Hirose
Mamoru Tashiro
Shunpei Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Priority to JP14506790A priority Critical patent/JPH0317274A/ja
Publication of JPH0317274A publication Critical patent/JPH0317274A/ja
Publication of JPH0543792B2 publication Critical patent/JPH0543792B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
JP14506790A 1990-06-01 1990-06-01 被膜形成方法 Granted JPH0317274A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14506790A JPH0317274A (ja) 1990-06-01 1990-06-01 被膜形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14506790A JPH0317274A (ja) 1990-06-01 1990-06-01 被膜形成方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP61266834A Division JPS63121667A (ja) 1986-11-10 1986-11-10 薄膜形成装置

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP6145738A Division JP2769977B2 (ja) 1994-06-06 1994-06-06 プラズマ処理方法
JP6145739A Division JP2739286B2 (ja) 1994-06-06 1994-06-06 プラズマ処理方法

Publications (2)

Publication Number Publication Date
JPH0317274A JPH0317274A (ja) 1991-01-25
JPH0543792B2 true JPH0543792B2 (enrdf_load_stackoverflow) 1993-07-02

Family

ID=15376617

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14506790A Granted JPH0317274A (ja) 1990-06-01 1990-06-01 被膜形成方法

Country Status (1)

Country Link
JP (1) JPH0317274A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2769977B2 (ja) * 1994-06-06 1998-06-25 株式会社半導体エネルギー研究所 プラズマ処理方法
KR20040033796A (ko) * 2002-10-16 2004-04-28 현대자동차주식회사 인젝터의 연료분사각 조절장치
JP4739836B2 (ja) * 2005-07-07 2011-08-03 トヨタ自動車株式会社 火花点火式筒内噴射型内燃機関の制御装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60103098A (ja) * 1983-11-04 1985-06-07 Kyocera Corp ダイヤモンド膜の製造方法

Also Published As

Publication number Publication date
JPH0317274A (ja) 1991-01-25

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