JPH0317274A - 被膜形成方法 - Google Patents
被膜形成方法Info
- Publication number
- JPH0317274A JPH0317274A JP14506790A JP14506790A JPH0317274A JP H0317274 A JPH0317274 A JP H0317274A JP 14506790 A JP14506790 A JP 14506790A JP 14506790 A JP14506790 A JP 14506790A JP H0317274 A JPH0317274 A JP H0317274A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic field
- substrate
- film
- gas
- microwaves
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000015572 biosynthetic process Effects 0.000 title description 5
- 239000000758 substrate Substances 0.000 claims abstract description 31
- 230000005684 electric field Effects 0.000 claims abstract description 20
- 229910003460 diamond Inorganic materials 0.000 claims abstract description 10
- 239000010432 diamond Substances 0.000 claims abstract description 10
- 238000000034 method Methods 0.000 claims description 12
- 230000003993 interaction Effects 0.000 claims description 8
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 abstract description 4
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 abstract description 2
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 abstract description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 abstract 2
- 239000010408 film Substances 0.000 description 32
- 239000007789 gas Substances 0.000 description 15
- 239000010409 thin film Substances 0.000 description 9
- 229910052799 carbon Inorganic materials 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 3
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000001475 halogen functional group Chemical group 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 241000894007 species Species 0.000 description 2
- 229910000951 Aluminide Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 241001364096 Pachycephalidae Species 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000005094 computer simulation Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 235000012489 doughnuts Nutrition 0.000 description 1
- 238000002003 electron diffraction Methods 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- UIUXUFNYAYAMOE-UHFFFAOYSA-N methylsilane Chemical compound [SiH3]C UIUXUFNYAYAMOE-UHFFFAOYSA-N 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14506790A JPH0317274A (ja) | 1990-06-01 | 1990-06-01 | 被膜形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14506790A JPH0317274A (ja) | 1990-06-01 | 1990-06-01 | 被膜形成方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61266834A Division JPS63121667A (ja) | 1986-11-10 | 1986-11-10 | 薄膜形成装置 |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6145738A Division JP2769977B2 (ja) | 1994-06-06 | 1994-06-06 | プラズマ処理方法 |
| JP6145739A Division JP2739286B2 (ja) | 1994-06-06 | 1994-06-06 | プラズマ処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0317274A true JPH0317274A (ja) | 1991-01-25 |
| JPH0543792B2 JPH0543792B2 (enrdf_load_stackoverflow) | 1993-07-02 |
Family
ID=15376617
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14506790A Granted JPH0317274A (ja) | 1990-06-01 | 1990-06-01 | 被膜形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0317274A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07166359A (ja) * | 1994-06-06 | 1995-06-27 | Semiconductor Energy Lab Co Ltd | プラズマ処理方法 |
| KR20040033796A (ko) * | 2002-10-16 | 2004-04-28 | 현대자동차주식회사 | 인젝터의 연료분사각 조절장치 |
| JP2007016694A (ja) * | 2005-07-07 | 2007-01-25 | Toyota Motor Corp | 火花点火式筒内噴射型内燃機関の制御装置 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60103098A (ja) * | 1983-11-04 | 1985-06-07 | Kyocera Corp | ダイヤモンド膜の製造方法 |
-
1990
- 1990-06-01 JP JP14506790A patent/JPH0317274A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60103098A (ja) * | 1983-11-04 | 1985-06-07 | Kyocera Corp | ダイヤモンド膜の製造方法 |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07166359A (ja) * | 1994-06-06 | 1995-06-27 | Semiconductor Energy Lab Co Ltd | プラズマ処理方法 |
| KR20040033796A (ko) * | 2002-10-16 | 2004-04-28 | 현대자동차주식회사 | 인젝터의 연료분사각 조절장치 |
| JP2007016694A (ja) * | 2005-07-07 | 2007-01-25 | Toyota Motor Corp | 火花点火式筒内噴射型内燃機関の制御装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0543792B2 (enrdf_load_stackoverflow) | 1993-07-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |