JPH0533819B2 - - Google Patents
Info
- Publication number
- JPH0533819B2 JPH0533819B2 JP63009849A JP984988A JPH0533819B2 JP H0533819 B2 JPH0533819 B2 JP H0533819B2 JP 63009849 A JP63009849 A JP 63009849A JP 984988 A JP984988 A JP 984988A JP H0533819 B2 JPH0533819 B2 JP H0533819B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- cleaning
- substrates
- holes
- cleaned
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP984988A JPH01184926A (ja) | 1988-01-20 | 1988-01-20 | 洗浄装置および洗浄方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP984988A JPH01184926A (ja) | 1988-01-20 | 1988-01-20 | 洗浄装置および洗浄方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01184926A JPH01184926A (ja) | 1989-07-24 |
JPH0533819B2 true JPH0533819B2 (enrdf_load_stackoverflow) | 1993-05-20 |
Family
ID=11731582
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP984988A Granted JPH01184926A (ja) | 1988-01-20 | 1988-01-20 | 洗浄装置および洗浄方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01184926A (enrdf_load_stackoverflow) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5503171A (en) * | 1992-12-26 | 1996-04-02 | Tokyo Electron Limited | Substrates-washing apparatus |
JP3183123B2 (ja) * | 1995-08-30 | 2001-07-03 | 信越半導体株式会社 | エッチング装置 |
DE19644253A1 (de) * | 1996-10-24 | 1998-05-07 | Steag Micro Tech Gmbh | Vorrichtung zum Behandeln von Substraten |
JP3320640B2 (ja) * | 1997-07-23 | 2002-09-03 | 東京エレクトロン株式会社 | 洗浄装置 |
JPH1154471A (ja) | 1997-08-05 | 1999-02-26 | Tokyo Electron Ltd | 処理装置及び処理方法 |
US6115867A (en) | 1997-08-18 | 2000-09-12 | Tokyo Electron Limited | Apparatus for cleaning both sides of substrate |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5848423A (ja) * | 1981-09-17 | 1983-03-22 | Matsushita Electric Ind Co Ltd | 洗浄槽 |
JPS6159838A (ja) * | 1984-08-31 | 1986-03-27 | Toshiba Ceramics Co Ltd | ウエ−ハ洗浄装置 |
JPS62213257A (ja) * | 1986-03-14 | 1987-09-19 | Mitsubishi Electric Corp | 湿式処理槽 |
-
1988
- 1988-01-20 JP JP984988A patent/JPH01184926A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPH01184926A (ja) | 1989-07-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term | ||
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080520 Year of fee payment: 15 |