JPS6347258B2 - - Google Patents

Info

Publication number
JPS6347258B2
JPS6347258B2 JP57042608A JP4260882A JPS6347258B2 JP S6347258 B2 JPS6347258 B2 JP S6347258B2 JP 57042608 A JP57042608 A JP 57042608A JP 4260882 A JP4260882 A JP 4260882A JP S6347258 B2 JPS6347258 B2 JP S6347258B2
Authority
JP
Japan
Prior art keywords
cleaning
tank
wafer
liquid
drain
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57042608A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58161328A (ja
Inventor
Hironori Inoe
Michoshi Maki
Kyotaka Kano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4260882A priority Critical patent/JPS58161328A/ja
Publication of JPS58161328A publication Critical patent/JPS58161328A/ja
Publication of JPS6347258B2 publication Critical patent/JPS6347258B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Feeding Of Articles By Means Other Than Belts Or Rollers (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP4260882A 1982-03-19 1982-03-19 薄片状物品の洗浄装置 Granted JPS58161328A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4260882A JPS58161328A (ja) 1982-03-19 1982-03-19 薄片状物品の洗浄装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4260882A JPS58161328A (ja) 1982-03-19 1982-03-19 薄片状物品の洗浄装置

Publications (2)

Publication Number Publication Date
JPS58161328A JPS58161328A (ja) 1983-09-24
JPS6347258B2 true JPS6347258B2 (enrdf_load_stackoverflow) 1988-09-21

Family

ID=12640742

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4260882A Granted JPS58161328A (ja) 1982-03-19 1982-03-19 薄片状物品の洗浄装置

Country Status (1)

Country Link
JP (1) JPS58161328A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210114995A (ko) * 2019-02-05 2021-09-24 파라곤 툴즈, 에스.엘. 치과 구조물에 스크류를 안착시키기 위한 밀링 공구

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3057163B2 (ja) * 1993-12-08 2000-06-26 東京エレクトロン株式会社 洗浄方法及び洗浄装置
JP5798505B2 (ja) * 2011-04-27 2015-10-21 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5143040Y2 (enrdf_load_stackoverflow) * 1972-07-13 1976-10-19
JPS6030332Y2 (ja) * 1976-08-26 1985-09-11 昭太郎 志村 ストレス調整具
JPS55158634A (en) * 1979-05-30 1980-12-10 Fujitsu Ltd Treating device for photo-mask, etc.

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210114995A (ko) * 2019-02-05 2021-09-24 파라곤 툴즈, 에스.엘. 치과 구조물에 스크류를 안착시키기 위한 밀링 공구

Also Published As

Publication number Publication date
JPS58161328A (ja) 1983-09-24

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