JPH0528490B2 - - Google Patents
Info
- Publication number
- JPH0528490B2 JPH0528490B2 JP12244385A JP12244385A JPH0528490B2 JP H0528490 B2 JPH0528490 B2 JP H0528490B2 JP 12244385 A JP12244385 A JP 12244385A JP 12244385 A JP12244385 A JP 12244385A JP H0528490 B2 JPH0528490 B2 JP H0528490B2
- Authority
- JP
- Japan
- Prior art keywords
- concentration
- ammonia
- ultraviolet
- hydrogen peroxide
- absorbance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 111
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 106
- 238000004140 cleaning Methods 0.000 claims description 82
- 229910021529 ammonia Inorganic materials 0.000 claims description 55
- 239000007788 liquid Substances 0.000 claims description 43
- 238000002835 absorbance Methods 0.000 claims description 35
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 26
- 239000001301 oxygen Substances 0.000 claims description 26
- 229910052760 oxygen Inorganic materials 0.000 claims description 26
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 claims description 24
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 12
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 10
- 238000005259 measurement Methods 0.000 claims description 4
- 238000001514 detection method Methods 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000000243 solution Substances 0.000 description 21
- 238000010521 absorption reaction Methods 0.000 description 11
- 239000000523 sample Substances 0.000 description 10
- 235000012431 wafers Nutrition 0.000 description 10
- 239000002253 acid Substances 0.000 description 9
- 239000007864 aqueous solution Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 238000005070 sampling Methods 0.000 description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- 235000011114 ammonium hydroxide Nutrition 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000004448 titration Methods 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000004043 responsiveness Effects 0.000 description 1
- 239000012488 sample solution Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12244385A JPS61281532A (ja) | 1985-06-07 | 1985-06-07 | 半導体洗浄液の濃度調整方法及びその装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12244385A JPS61281532A (ja) | 1985-06-07 | 1985-06-07 | 半導体洗浄液の濃度調整方法及びその装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61281532A JPS61281532A (ja) | 1986-12-11 |
| JPH0528490B2 true JPH0528490B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-04-26 |
Family
ID=14835972
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12244385A Granted JPS61281532A (ja) | 1985-06-07 | 1985-06-07 | 半導体洗浄液の濃度調整方法及びその装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61281532A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02722U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1988-06-10 | 1990-01-05 | ||
| US5275184A (en) * | 1990-10-19 | 1994-01-04 | Dainippon Screen Mfg. Co., Ltd. | Apparatus and system for treating surface of a wafer by dipping the same in a treatment solution and a gate device for chemical agent used in the apparatus and the system |
| JP3473063B2 (ja) | 1993-11-15 | 2003-12-02 | 松下電器産業株式会社 | シリコン基板の洗浄方法 |
| JP3146841B2 (ja) * | 1994-03-28 | 2001-03-19 | 信越半導体株式会社 | ウエーハのリンス装置 |
| US5715173A (en) * | 1994-06-27 | 1998-02-03 | Dainippon Screen Mfg. Co., Ltd. | Concentration controlling method and a substate treating apparatus utilizing same |
| JP2701760B2 (ja) * | 1994-11-14 | 1998-01-21 | 日本電気株式会社 | 薬液組成モニタ装置 |
| JP3093975B2 (ja) * | 1996-07-02 | 2000-10-03 | 株式会社平間理化研究所 | レジスト剥離液管理装置 |
| US6158447A (en) * | 1997-09-09 | 2000-12-12 | Tokyo Electron Limited | Cleaning method and cleaning equipment |
| DE19815039A1 (de) * | 1998-03-02 | 1999-09-16 | Mostafa Sabet | Verfahren zum Wechseln eines in einem Behandlungsbecken enthaltenen Behandlungsmediums und Anlage zur Ausführung des Verfahrens |
| KR20000050397A (ko) * | 1999-01-08 | 2000-08-05 | 윤종용 | 반도체 세정액 농도 제어장치 및 방법 |
| US6415803B1 (en) * | 1999-10-06 | 2002-07-09 | Z Cap, L.L.C. | Method and apparatus for semiconductor wafer cleaning with reuse of chemicals |
| AU2002330225A1 (en) * | 2001-10-08 | 2003-05-12 | Advanced Technology Materials, Inc. | Real-time component monitoring and replenishment system for multicomponent fluids |
| JP2005230798A (ja) * | 2004-01-22 | 2005-09-02 | Sankyo Seiki Mfg Co Ltd | 洗浄装置 |
-
1985
- 1985-06-07 JP JP12244385A patent/JPS61281532A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61281532A (ja) | 1986-12-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5820823A (en) | Method and apparatus for the measurement of dissolved carbon | |
| US5798271A (en) | Apparatus for the measurement of dissolved carbon in deionized water | |
| JPH0528490B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
| US6943878B2 (en) | Methods and systems for controlling the concentration of a component in a composition with absorption spectroscopy | |
| CN103155113B (zh) | 基板处理装置 | |
| JP4112360B2 (ja) | パルスフロー全有機炭素分析装置 | |
| JPS6291861A (ja) | 化学的モニタのオンライン較正装置 | |
| US6228325B1 (en) | Methods and apparatus for measurement of the carbon and heteroorganic content of water including single-cell instrumentation mode for same | |
| JPS628040A (ja) | 洗浄装置 | |
| US3969626A (en) | Method and apparatus for detecting total reduced sulfur | |
| US8618820B2 (en) | Method and device for measuring the purity of ultrapure water | |
| CN113218890B (zh) | 用于水溶液中二氧化硅和磷酸盐的序列分析的仪器 | |
| JPS6316901B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
| JP2763275B2 (ja) | 塩素イオン自動分析装置 | |
| JPH0339491A (ja) | 薄膜エッチング装置 | |
| JP3078199B2 (ja) | 濃度制御方法及びこれを利用した基板処理装置 | |
| Fried et al. | Laser photoacoustic detection of nitrogen dioxide in the gas-phase titration of nitric oxide with ozone | |
| KR20230149437A (ko) | 유량모니터링을 이용한 이산화탄소 정량시스템과 이산화탄소 정량방법 그리고 이것이 구비된 총유기탄소 분석기 | |
| JP3234112B2 (ja) | 処理液濃度制御方法及びこれを利用した処理液濃度制御装置 | |
| US5734097A (en) | Analyzer and method for measuring water in liquids | |
| JPH11142320A (ja) | 濃度測定方法およびこれを用いた基板処理装置 | |
| JP3237400B2 (ja) | 水中の窒素化合物及びリン化合物の分析装置 | |
| KR102744363B1 (ko) | 녹색 및 계량화학에 기반한 무기질소 측정방법 및 장치 | |
| JP3333237B2 (ja) | ガルバニ電池タイプの酸素分析計およびこの分析計の制御方法 | |
| JP3264090B2 (ja) | 窒素化合物、リン化合物及び有機汚濁物質の計測装置 |