JPH05241321A - 光学マスク及びその修正方法 - Google Patents

光学マスク及びその修正方法

Info

Publication number
JPH05241321A
JPH05241321A JP4281492A JP4281492A JPH05241321A JP H05241321 A JPH05241321 A JP H05241321A JP 4281492 A JP4281492 A JP 4281492A JP 4281492 A JP4281492 A JP 4281492A JP H05241321 A JPH05241321 A JP H05241321A
Authority
JP
Japan
Prior art keywords
shifter
mask
phase
stopper layer
defect
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4281492A
Other languages
English (en)
Japanese (ja)
Inventor
Akira Shimase
朗 嶋瀬
Junzo Azuma
淳三 東
Satoshi Haraichi
聡 原市
Fumikazu Ito
文和 伊藤
Yasuhiro Koizumi
裕弘 古泉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4281492A priority Critical patent/JPH05241321A/ja
Priority to KR1019930002477A priority patent/KR960001685B1/ko
Priority to US08/022,909 priority patent/US5439763A/en
Publication of JPH05241321A publication Critical patent/JPH05241321A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/76—Patterning of masks by imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP4281492A 1991-03-19 1992-02-28 光学マスク及びその修正方法 Pending JPH05241321A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP4281492A JPH05241321A (ja) 1992-02-28 1992-02-28 光学マスク及びその修正方法
KR1019930002477A KR960001685B1 (ko) 1992-02-28 1993-02-23 광학 마스크 및 그의 수정 방법
US08/022,909 US5439763A (en) 1991-03-19 1993-02-26 Optical mask and method of correcting the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4281492A JPH05241321A (ja) 1992-02-28 1992-02-28 光学マスク及びその修正方法

Publications (1)

Publication Number Publication Date
JPH05241321A true JPH05241321A (ja) 1993-09-21

Family

ID=12646420

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4281492A Pending JPH05241321A (ja) 1991-03-19 1992-02-28 光学マスク及びその修正方法

Country Status (2)

Country Link
JP (1) JPH05241321A (ko)
KR (1) KR960001685B1 (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100456760B1 (ko) * 2001-04-18 2004-11-10 미쓰비시덴키 가부시키가이샤 포토마스크의 세정 방법
JP2006500231A (ja) * 2002-09-20 2006-01-05 イリディグム ディスプレイ コーポレイション マイクロ電気機械システムデバイス内の構造の電気機械的挙動の制御

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0278216A (ja) * 1988-09-14 1990-03-19 Hitachi Ltd 半導体装置の製造方法
JPH03196041A (ja) * 1989-12-26 1991-08-27 Hitachi Ltd パターン形成方法及びマスク修正方法
JPH03267940A (ja) * 1989-04-28 1991-11-28 Fujitsu Ltd マスク及びその製造方法並びにマスクを用いたパターン形成方法
JPH0426846A (ja) * 1990-05-22 1992-01-30 Sony Corp 位相シフトマスクのマスク修正装置
JPH04233541A (ja) * 1990-12-28 1992-08-21 Fujitsu Ltd 光学マスクとその欠陥修正方法
JPH0580490A (ja) * 1991-09-20 1993-04-02 Toppan Printing Co Ltd 位相シフトマスクおよびその製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0278216A (ja) * 1988-09-14 1990-03-19 Hitachi Ltd 半導体装置の製造方法
JPH03267940A (ja) * 1989-04-28 1991-11-28 Fujitsu Ltd マスク及びその製造方法並びにマスクを用いたパターン形成方法
JPH03196041A (ja) * 1989-12-26 1991-08-27 Hitachi Ltd パターン形成方法及びマスク修正方法
JPH0426846A (ja) * 1990-05-22 1992-01-30 Sony Corp 位相シフトマスクのマスク修正装置
JPH04233541A (ja) * 1990-12-28 1992-08-21 Fujitsu Ltd 光学マスクとその欠陥修正方法
JPH0580490A (ja) * 1991-09-20 1993-04-02 Toppan Printing Co Ltd 位相シフトマスクおよびその製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100456760B1 (ko) * 2001-04-18 2004-11-10 미쓰비시덴키 가부시키가이샤 포토마스크의 세정 방법
JP2006500231A (ja) * 2002-09-20 2006-01-05 イリディグム ディスプレイ コーポレイション マイクロ電気機械システムデバイス内の構造の電気機械的挙動の制御
JP4800619B2 (ja) * 2002-09-20 2011-10-26 クゥアルコム・メムス・テクノロジーズ・インコーポレイテッド マイクロ電気機械システムデバイス内の構造の電気機械的挙動の制御

Also Published As

Publication number Publication date
KR960001685B1 (ko) 1996-02-03
KR930018652A (ko) 1993-09-22

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