JPH0521121B2 - - Google Patents

Info

Publication number
JPH0521121B2
JPH0521121B2 JP60223324A JP22332485A JPH0521121B2 JP H0521121 B2 JPH0521121 B2 JP H0521121B2 JP 60223324 A JP60223324 A JP 60223324A JP 22332485 A JP22332485 A JP 22332485A JP H0521121 B2 JPH0521121 B2 JP H0521121B2
Authority
JP
Japan
Prior art keywords
photopolymerizable composition
compound
group
composition according
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60223324A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6281404A (ja
Inventor
Isao Sasaki
Nobuhiro Mukai
Hitoshi Ishita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Rayon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Rayon Co Ltd filed Critical Mitsubishi Rayon Co Ltd
Priority to JP60223324A priority Critical patent/JPS6281404A/ja
Priority to US06/847,197 priority patent/US4826888A/en
Priority to AU57192/86A priority patent/AU594336B2/en
Priority to CA000508595A priority patent/CA1282541C/en
Priority to EP86106431A priority patent/EP0201903B1/en
Priority to DE8686106431T priority patent/DE3680711D1/de
Publication of JPS6281404A publication Critical patent/JPS6281404A/ja
Publication of JPH0521121B2 publication Critical patent/JPH0521121B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Dental Preparations (AREA)
  • Polymerisation Methods In General (AREA)
JP60223324A 1985-05-13 1985-10-07 光重合性組成物 Granted JPS6281404A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP60223324A JPS6281404A (ja) 1985-10-07 1985-10-07 光重合性組成物
US06/847,197 US4826888A (en) 1985-10-07 1986-04-02 Photopolymerizable composition
AU57192/86A AU594336B2 (en) 1985-05-13 1986-05-06 Photopolymerisable composition
CA000508595A CA1282541C (en) 1985-05-13 1986-05-07 Photopolymerizable composition
EP86106431A EP0201903B1 (en) 1985-05-13 1986-05-12 Photopolymerizable composition
DE8686106431T DE3680711D1 (de) 1985-05-13 1986-05-12 Photopolymerisierbare zusammensetzung.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60223324A JPS6281404A (ja) 1985-10-07 1985-10-07 光重合性組成物

Publications (2)

Publication Number Publication Date
JPS6281404A JPS6281404A (ja) 1987-04-14
JPH0521121B2 true JPH0521121B2 (en, 2012) 1993-03-23

Family

ID=16796367

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60223324A Granted JPS6281404A (ja) 1985-05-13 1985-10-07 光重合性組成物

Country Status (2)

Country Link
US (1) US4826888A (en, 2012)
JP (1) JPS6281404A (en, 2012)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2653458B2 (ja) * 1988-03-26 1997-09-17 旭化成工業株式会社 凸版印刷版用感光性樹脂組成物
US5217760A (en) * 1990-07-20 1993-06-08 Loctite Corporation Free radically curable formulations employing dithiolate catalysts
JP3859182B2 (ja) * 1997-03-27 2006-12-20 東京応化工業株式会社 ネガ型ホトレジスト組成物
MY120763A (en) * 1997-09-19 2005-11-30 Hitachi Chemical Co Ltd Photosensitive film, process for laminating photosensitive resin layer, photosensitive resin layer-laminated substrate and process for curing photosensitive resin layer
US6204302B1 (en) 1998-11-20 2001-03-20 Bisco, Inc. Photosensitizers for free radical polymerization initiation resins and method of making the same
JP4163561B2 (ja) * 2003-06-17 2008-10-08 富士フイルム株式会社 色素化合物
JP5895264B2 (ja) * 2011-12-27 2016-03-30 株式会社トクヤマデンタル 歯科用充填修復キット
JP6333274B2 (ja) * 2013-10-10 2018-05-30 クラレノリタケデンタル株式会社 歯科用接着キット
JP7604811B2 (ja) * 2020-05-15 2024-12-24 Ｔｏｐｐａｎホールディングス株式会社 量子ドット含有組成物、及び、前記量子ドット含有組成物を用いた量子ドット含有部材、バックライト装置、表示装置、並びに、液晶表示素子
CN117757458B (zh) * 2024-02-22 2024-04-19 广饶六合化工有限公司 一种季铵盐类复合黏土稳定剂

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3639321A (en) * 1967-05-06 1972-02-01 Bayer Ag Polyester moulding and coating materials which can be hardened by uv-irradiation
US3829369A (en) * 1972-10-19 1974-08-13 American Can Co 4-methoxy benzene diazonium hexafluorophosphate catalyst for photopolymers in epoxy systems
DE2720228B2 (de) * 1976-05-06 1979-10-18 Japan Synthetic Rubber Co., Ltd., Tokio Photopolymerisierbares Gemisch und seine Verwendung
US4204928A (en) * 1977-03-01 1980-05-27 Stauffer Chemical Company Photopolymerizable composition stabilized with nitrogen-containing aromatic compounds
US4330612A (en) * 1979-01-23 1982-05-18 Japan Synthetic Rubber Co., Ltd. Laminate of monolayer film of cyclized butadiene polymer and other photosensitive layer
US4349619A (en) * 1979-09-19 1982-09-14 Japan Synthetic Rubber Co., Ltd. Photoresist composition
DE2944866A1 (de) * 1979-11-07 1981-05-21 Hoechst Ag, 6000 Frankfurt Photopolymerisierbares gemisch und damit hergestelltes photopolymerisierbares kopiermaterial
JPS57176035A (en) * 1981-03-30 1982-10-29 Du Pont Photosensitive composition
JPS57211145A (en) * 1981-06-23 1982-12-24 Japan Synthetic Rubber Co Ltd Photoresist composition
JPS60149603A (ja) * 1984-01-17 1985-08-07 Kuraray Co Ltd 光重合性の組成物
JPS60197609A (ja) * 1984-03-16 1985-10-07 Kuraray Co Ltd 歯科用組成物
US4777190A (en) * 1985-05-13 1988-10-11 Mitsubishi Rayon Company Limited Photopolymerizable composition based on a vinyl compound, a sulfur-containing compound and an α-diketone

Also Published As

Publication number Publication date
JPS6281404A (ja) 1987-04-14
US4826888A (en) 1989-05-02

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