JPH0515060B2 - - Google Patents

Info

Publication number
JPH0515060B2
JPH0515060B2 JP60078399A JP7839985A JPH0515060B2 JP H0515060 B2 JPH0515060 B2 JP H0515060B2 JP 60078399 A JP60078399 A JP 60078399A JP 7839985 A JP7839985 A JP 7839985A JP H0515060 B2 JPH0515060 B2 JP H0515060B2
Authority
JP
Japan
Prior art keywords
container
quartz
quartz container
cleaning
ipa
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60078399A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61237430A (ja
Inventor
Masaki Kusuhara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wakomu KK
Original Assignee
Wakomu KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wakomu KK filed Critical Wakomu KK
Priority to JP60078399A priority Critical patent/JPS61237430A/ja
Priority to US06/821,545 priority patent/US4736758A/en
Priority to AT86101834T priority patent/ATE75784T1/de
Priority to EP86101834A priority patent/EP0198169B1/en
Priority to DE8686101834T priority patent/DE3685148D1/de
Publication of JPS61237430A publication Critical patent/JPS61237430A/ja
Priority to US07/108,555 priority patent/US4777970A/en
Publication of JPH0515060B2 publication Critical patent/JPH0515060B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P72/0408—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D12/00—Displacing liquid, e.g. from wet solids or from dispersions of liquids or from solids in liquids, by means of another liquid
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/04—Apparatus
    • F26B21/471—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP60078399A 1985-04-15 1985-04-15 半導体蒸気乾燥洗浄用石英容器 Granted JPS61237430A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP60078399A JPS61237430A (ja) 1985-04-15 1985-04-15 半導体蒸気乾燥洗浄用石英容器
US06/821,545 US4736758A (en) 1985-04-15 1986-01-21 Vapor drying apparatus
AT86101834T ATE75784T1 (de) 1985-04-15 1986-02-13 Einrichtung zum dampftrocknen.
EP86101834A EP0198169B1 (en) 1985-04-15 1986-02-13 Vapor drying apparatus
DE8686101834T DE3685148D1 (de) 1985-04-15 1986-02-13 Einrichtung zum dampftrocknen.
US07/108,555 US4777970A (en) 1985-04-15 1987-10-14 Vapor drying apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60078399A JPS61237430A (ja) 1985-04-15 1985-04-15 半導体蒸気乾燥洗浄用石英容器

Publications (2)

Publication Number Publication Date
JPS61237430A JPS61237430A (ja) 1986-10-22
JPH0515060B2 true JPH0515060B2 (en:Method) 1993-02-26

Family

ID=13660943

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60078399A Granted JPS61237430A (ja) 1985-04-15 1985-04-15 半導体蒸気乾燥洗浄用石英容器

Country Status (1)

Country Link
JP (1) JPS61237430A (en:Method)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH062263Y2 (ja) * 1986-12-25 1994-01-19 徳山曹達株式会社 乾燥装置
JP3003016B2 (ja) * 1992-12-25 2000-01-24 東京エレクトロン株式会社 処理装置及び処理方法
JP2928432B2 (ja) * 1993-02-16 1999-08-03 東京エレクトロン株式会社 半導体ウエハの蒸気乾燥装置及びその消火方法及び洗浄システム
JPH07312358A (ja) * 1995-01-31 1995-11-28 Sony Corp 洗浄装置
JP5627484B2 (ja) * 2011-01-28 2014-11-19 大日本スクリーン製造株式会社 蒸気発生装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5420014A (en) * 1977-07-18 1979-02-15 Denki Kagaku Kogyo Kk Method of making molten silicate base container
DE2928089C3 (de) * 1979-07-12 1982-03-04 Heraeus Quarzschmelze Gmbh, 6450 Hanau Verbundtiegel für halbleitertechnologische Zwecke und Verfahren zur Herstellung
JPS5910046U (ja) * 1982-07-12 1984-01-21 トヨタ自動車株式会社 シヤシダイナモメ−タ用車輪固定治具
JPS59189581A (ja) * 1983-04-11 1984-10-27 株式会社渡辺商行 可燃性液体加熱装置

Also Published As

Publication number Publication date
JPS61237430A (ja) 1986-10-22

Similar Documents

Publication Publication Date Title
JP3461642B2 (ja) 基板乾燥装置
US5443540A (en) Apparatus and method for drying substrates
JP3715052B2 (ja) ウェーハ乾燥装置
US5308955A (en) Vertical heat treatment apparatus with vented heat insulation cover means
US20060237054A1 (en) Apparatus and method for washing quartz parts, particularly for process equipment used in semiconductor industries
JPH0515060B2 (en:Method)
US6536450B1 (en) Fluid heating system for processing semiconductor materials
US12519007B2 (en) Support unit and substrate treating apparatus
JPH0697149A (ja) 蒸気乾燥法
KR100712170B1 (ko) 냉각 장치 및 이를 이용한 열 처리 장치
JPH0727474A (ja) 真空乾燥装置
US6736150B2 (en) Fluid heating system for processing semiconductor materials
JPH09162154A (ja) 基板処理装置
JP2018019016A (ja) 基板処理装置
JPH0271513A (ja) 半導体製造装置
KR980011979A (ko) 웨이퍼 세정/건조 장치 및 방법
JPH0457094B2 (en:Method)
JPH04147612A (ja) 基板加熱装置
JPH01302816A (ja) 縦型熱処理装置
JPH0691053B2 (ja) 半導体ウエハの処理装置
JPS63114118A (ja) 薄膜加工用圧着ヒ−タ支持装置
JPS63102234A (ja) ウエハ乾燥方式
JPH09199509A (ja) 半導体成膜装置
JPH05190479A (ja) 縦型熱処理装置
JP2002025995A (ja) 縦型熱処理装置