JPH04948B2 - - Google Patents

Info

Publication number
JPH04948B2
JPH04948B2 JP60053277A JP5327785A JPH04948B2 JP H04948 B2 JPH04948 B2 JP H04948B2 JP 60053277 A JP60053277 A JP 60053277A JP 5327785 A JP5327785 A JP 5327785A JP H04948 B2 JPH04948 B2 JP H04948B2
Authority
JP
Japan
Prior art keywords
target
silicon nitride
silicon
density
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60053277A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61215259A (ja
Inventor
Shigeo Mizoguchi
Yasunobu Yoshinaga
Kazuo Abe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SHINKU ZAIRYO KK
Original Assignee
SHINKU ZAIRYO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SHINKU ZAIRYO KK filed Critical SHINKU ZAIRYO KK
Priority to JP60053277A priority Critical patent/JPS61215259A/ja
Publication of JPS61215259A publication Critical patent/JPS61215259A/ja
Publication of JPH04948B2 publication Critical patent/JPH04948B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Ceramic Products (AREA)
JP60053277A 1985-03-19 1985-03-19 スパツタリング用窒化ケイ素タ−ゲツトの製法 Granted JPS61215259A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60053277A JPS61215259A (ja) 1985-03-19 1985-03-19 スパツタリング用窒化ケイ素タ−ゲツトの製法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60053277A JPS61215259A (ja) 1985-03-19 1985-03-19 スパツタリング用窒化ケイ素タ−ゲツトの製法

Publications (2)

Publication Number Publication Date
JPS61215259A JPS61215259A (ja) 1986-09-25
JPH04948B2 true JPH04948B2 (en:Method) 1992-01-09

Family

ID=12938241

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60053277A Granted JPS61215259A (ja) 1985-03-19 1985-03-19 スパツタリング用窒化ケイ素タ−ゲツトの製法

Country Status (1)

Country Link
JP (1) JPS61215259A (en:Method)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0283261A (ja) * 1988-09-21 1990-03-23 Shin Etsu Chem Co Ltd スパッタリング用窒化珪素系ターゲット材料
JP5206111B2 (ja) * 2008-05-19 2013-06-12 大日本印刷株式会社 イオンプレーティング用蒸発源材料の原料粉末、イオンプレーティング用蒸発源材料及びその製造方法、ガスバリア性シートの製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54123110A (en) * 1978-03-17 1979-09-25 Tokyo Shibaura Electric Co Production of siliconee ceramics
JPS56141153A (en) * 1980-04-03 1981-11-04 Toshiba Corp Target for x-ray tube
JPS56169773A (en) * 1980-05-30 1981-12-26 Sharp Corp Target for spattering by plenar magnetron
JPS5774177A (en) * 1980-10-29 1982-05-10 Toshiba Corp Thin film thermal head
JPS5874585A (ja) * 1981-10-26 1983-05-06 三菱マテリアル株式会社 高速切削用表面被覆窒化けい素基焼結部材
JPS58118273A (ja) * 1982-01-06 1983-07-14 Hitachi Ltd 感熱記録ヘツド
JPS58161975A (ja) * 1982-03-16 1983-09-26 日本特殊陶業株式会社 窒化珪素焼結体の製造方法
JPS58204451A (ja) * 1982-05-21 1983-11-29 Seiko Epson Corp Ｘ線発生装置

Also Published As

Publication number Publication date
JPS61215259A (ja) 1986-09-25

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