JPS61215259A - スパツタリング用窒化ケイ素タ−ゲツトの製法 - Google Patents
スパツタリング用窒化ケイ素タ−ゲツトの製法Info
- Publication number
- JPS61215259A JPS61215259A JP60053277A JP5327785A JPS61215259A JP S61215259 A JPS61215259 A JP S61215259A JP 60053277 A JP60053277 A JP 60053277A JP 5327785 A JP5327785 A JP 5327785A JP S61215259 A JPS61215259 A JP S61215259A
- Authority
- JP
- Japan
- Prior art keywords
- silicon nitride
- target
- sputtering
- manufacture
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052581 Si3N4 Inorganic materials 0.000 title claims description 20
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 title claims description 20
- 238000004544 sputter deposition Methods 0.000 title claims description 7
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- 238000010304 firing Methods 0.000 claims description 4
- 239000010408 film Substances 0.000 description 20
- 230000015572 biosynthetic process Effects 0.000 description 10
- 239000000843 powder Substances 0.000 description 8
- 230000001681 protective effect Effects 0.000 description 8
- 238000005245 sintering Methods 0.000 description 7
- 238000004040 coloring Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000000203 mixture Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 2
- 239000000292 calcium oxide Substances 0.000 description 2
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000001739 density measurement Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- ZEKANFGSDXODPD-UHFFFAOYSA-N glyphosate-isopropylammonium Chemical compound CC(C)N.OC(=O)CNCP(O)(O)=O ZEKANFGSDXODPD-UHFFFAOYSA-N 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000011863 silicon-based powder Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Ceramic Products (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60053277A JPS61215259A (ja) | 1985-03-19 | 1985-03-19 | スパツタリング用窒化ケイ素タ−ゲツトの製法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60053277A JPS61215259A (ja) | 1985-03-19 | 1985-03-19 | スパツタリング用窒化ケイ素タ−ゲツトの製法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61215259A true JPS61215259A (ja) | 1986-09-25 |
| JPH04948B2 JPH04948B2 (en:Method) | 1992-01-09 |
Family
ID=12938241
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60053277A Granted JPS61215259A (ja) | 1985-03-19 | 1985-03-19 | スパツタリング用窒化ケイ素タ−ゲツトの製法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61215259A (en:Method) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0283261A (ja) * | 1988-09-21 | 1990-03-23 | Shin Etsu Chem Co Ltd | スパッタリング用窒化珪素系ターゲット材料 |
| JP2009280832A (ja) * | 2008-05-19 | 2009-12-03 | Dainippon Printing Co Ltd | イオンプレーティング用蒸発源材料の原料粉末、イオンプレーティング用蒸発源材料及びその製造方法、ガスバリア性シート及びその製造方法 |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54123110A (en) * | 1978-03-17 | 1979-09-25 | Tokyo Shibaura Electric Co | Production of siliconee ceramics |
| JPS56141153A (en) * | 1980-04-03 | 1981-11-04 | Toshiba Corp | Target for x-ray tube |
| JPS56169773A (en) * | 1980-05-30 | 1981-12-26 | Sharp Corp | Target for spattering by plenar magnetron |
| JPS5774177A (en) * | 1980-10-29 | 1982-05-10 | Toshiba Corp | Thin film thermal head |
| JPS5874585A (ja) * | 1981-10-26 | 1983-05-06 | 三菱マテリアル株式会社 | 高速切削用表面被覆窒化けい素基焼結部材 |
| JPS58118273A (ja) * | 1982-01-06 | 1983-07-14 | Hitachi Ltd | 感熱記録ヘツド |
| JPS58161975A (ja) * | 1982-03-16 | 1983-09-26 | 日本特殊陶業株式会社 | 窒化珪素焼結体の製造方法 |
| JPS58204451A (ja) * | 1982-05-21 | 1983-11-29 | Seiko Epson Corp | Ｘ線発生装置 |
-
1985
- 1985-03-19 JP JP60053277A patent/JPS61215259A/ja active Granted
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54123110A (en) * | 1978-03-17 | 1979-09-25 | Tokyo Shibaura Electric Co | Production of siliconee ceramics |
| JPS56141153A (en) * | 1980-04-03 | 1981-11-04 | Toshiba Corp | Target for x-ray tube |
| JPS56169773A (en) * | 1980-05-30 | 1981-12-26 | Sharp Corp | Target for spattering by plenar magnetron |
| JPS5774177A (en) * | 1980-10-29 | 1982-05-10 | Toshiba Corp | Thin film thermal head |
| JPS5874585A (ja) * | 1981-10-26 | 1983-05-06 | 三菱マテリアル株式会社 | 高速切削用表面被覆窒化けい素基焼結部材 |
| JPS58118273A (ja) * | 1982-01-06 | 1983-07-14 | Hitachi Ltd | 感熱記録ヘツド |
| JPS58161975A (ja) * | 1982-03-16 | 1983-09-26 | 日本特殊陶業株式会社 | 窒化珪素焼結体の製造方法 |
| JPS58204451A (ja) * | 1982-05-21 | 1983-11-29 | Seiko Epson Corp | Ｘ線発生装置 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0283261A (ja) * | 1988-09-21 | 1990-03-23 | Shin Etsu Chem Co Ltd | スパッタリング用窒化珪素系ターゲット材料 |
| JP2009280832A (ja) * | 2008-05-19 | 2009-12-03 | Dainippon Printing Co Ltd | イオンプレーティング用蒸発源材料の原料粉末、イオンプレーティング用蒸発源材料及びその製造方法、ガスバリア性シート及びその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH04948B2 (en:Method) | 1992-01-09 |
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