JPH048945B2 - - Google Patents

Info

Publication number
JPH048945B2
JPH048945B2 JP57089931A JP8993182A JPH048945B2 JP H048945 B2 JPH048945 B2 JP H048945B2 JP 57089931 A JP57089931 A JP 57089931A JP 8993182 A JP8993182 A JP 8993182A JP H048945 B2 JPH048945 B2 JP H048945B2
Authority
JP
Japan
Prior art keywords
jig
housing
wafer
storage
static electricity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57089931A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58207651A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP57089931A priority Critical patent/JPS58207651A/ja
Publication of JPS58207651A publication Critical patent/JPS58207651A/ja
Publication of JPH048945B2 publication Critical patent/JPH048945B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/15Horizontal carrier comprising wall type elements whereby the substrates are vertically supported, e.g. comprising sidewalls
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/15Horizontal carrier comprising wall type elements whereby the substrates are vertically supported, e.g. comprising sidewalls
    • H10P72/155Horizontal carrier comprising wall type elements whereby the substrates are vertically supported, e.g. comprising sidewalls characterised by a material, a roughness, a coating or the like

Landscapes

  • Workshop Equipment, Work Benches, Supports, Or Storage Means (AREA)
  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP57089931A 1982-05-28 1982-05-28 静電防止型収容治具 Granted JPS58207651A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57089931A JPS58207651A (ja) 1982-05-28 1982-05-28 静電防止型収容治具

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57089931A JPS58207651A (ja) 1982-05-28 1982-05-28 静電防止型収容治具

Publications (2)

Publication Number Publication Date
JPS58207651A JPS58207651A (ja) 1983-12-03
JPH048945B2 true JPH048945B2 (enExample) 1992-02-18

Family

ID=13984436

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57089931A Granted JPS58207651A (ja) 1982-05-28 1982-05-28 静電防止型収容治具

Country Status (1)

Country Link
JP (1) JPS58207651A (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6063941U (ja) * 1983-10-07 1985-05-07 信越化学工業株式会社 電子材料用ウエ−ハハンドリング用治具類
JPH0638413B2 (ja) * 1984-01-12 1994-05-18 三井東圧化学株式会社 ウェハ処理用容器
JPS6112099A (ja) * 1984-06-26 1986-01-20 倉敷紡績株式会社 半導体製造用治具
JPS6137842A (ja) * 1984-07-30 1986-02-22 Daikin Ind Ltd 非帯電性高分子材料
JPS6456866U (enExample) * 1987-09-30 1989-04-10
JPH0260954A (ja) * 1988-08-29 1990-03-01 Daikin Ind Ltd 非帯電性高分子材料
JPH02201926A (ja) * 1989-01-31 1990-08-10 Fujitsu Ltd ウエット洗浄用ホルダ及びウエット洗浄方法
JPH0312949A (ja) * 1989-06-12 1991-01-21 Fujitsu Ltd ウエハキャリア保持装置
JPH0380535A (ja) * 1989-08-23 1991-04-05 Fujitsu Ltd 洗浄ホルダ
KR100887126B1 (ko) * 2001-12-03 2009-03-04 이 아이 듀폰 디 네모아 앤드 캄파니 도전성 이송 부재 및 그의 제조 방법
CN1978074B (zh) * 2005-12-02 2010-11-10 鸿富锦精密工业(深圳)有限公司 镜片清洗治具
JP7090482B2 (ja) * 2018-06-18 2022-06-24 株式会社Screenホールディングス チャック部材及び基板処理装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50108880A (enExample) * 1974-02-01 1975-08-27
JPS53114670A (en) * 1977-03-17 1978-10-06 Toshiba Ceramics Co Jig for diffusion furnace

Also Published As

Publication number Publication date
JPS58207651A (ja) 1983-12-03

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