JPH0480733B2 - - Google Patents

Info

Publication number
JPH0480733B2
JPH0480733B2 JP28734285A JP28734285A JPH0480733B2 JP H0480733 B2 JPH0480733 B2 JP H0480733B2 JP 28734285 A JP28734285 A JP 28734285A JP 28734285 A JP28734285 A JP 28734285A JP H0480733 B2 JPH0480733 B2 JP H0480733B2
Authority
JP
Japan
Prior art keywords
etching chamber
valve
lid
vacuum
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP28734285A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62144742A (ja
Inventor
Yoshikazu Maegaki
Osamu Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Mechatronics Corp
Original Assignee
Shibaura Engineering Works Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shibaura Engineering Works Co Ltd filed Critical Shibaura Engineering Works Co Ltd
Priority to JP28734285A priority Critical patent/JPS62144742A/ja
Publication of JPS62144742A publication Critical patent/JPS62144742A/ja
Publication of JPH0480733B2 publication Critical patent/JPH0480733B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Drying Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
JP28734285A 1985-12-20 1985-12-20 真空処理装置 Granted JPS62144742A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28734285A JPS62144742A (ja) 1985-12-20 1985-12-20 真空処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28734285A JPS62144742A (ja) 1985-12-20 1985-12-20 真空処理装置

Publications (2)

Publication Number Publication Date
JPS62144742A JPS62144742A (ja) 1987-06-27
JPH0480733B2 true JPH0480733B2 (enrdf_load_stackoverflow) 1992-12-21

Family

ID=17716129

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28734285A Granted JPS62144742A (ja) 1985-12-20 1985-12-20 真空処理装置

Country Status (1)

Country Link
JP (1) JPS62144742A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04313038A (ja) * 1991-04-08 1992-11-05 Mitsubishi Electric Corp ガス漏れ量検出装置

Also Published As

Publication number Publication date
JPS62144742A (ja) 1987-06-27

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term