JPS62144742A - 真空処理装置 - Google Patents
真空処理装置Info
- Publication number
- JPS62144742A JPS62144742A JP28734285A JP28734285A JPS62144742A JP S62144742 A JPS62144742 A JP S62144742A JP 28734285 A JP28734285 A JP 28734285A JP 28734285 A JP28734285 A JP 28734285A JP S62144742 A JPS62144742 A JP S62144742A
- Authority
- JP
- Japan
- Prior art keywords
- etching chamber
- valve
- opened
- exhaust system
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000009489 vacuum treatment Methods 0.000 title 1
- 238000005530 etching Methods 0.000 abstract description 30
- 239000002341 toxic gas Substances 0.000 abstract description 10
- 238000001020 plasma etching Methods 0.000 abstract description 3
- 230000002411 adverse Effects 0.000 abstract description 2
- 238000011109 contamination Methods 0.000 abstract description 2
- 230000000694 effects Effects 0.000 abstract description 2
- 238000007599 discharging Methods 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 241000257465 Echinoidea Species 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 231100000989 no adverse effect Toxicity 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Drying Of Semiconductors (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28734285A JPS62144742A (ja) | 1985-12-20 | 1985-12-20 | 真空処理装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28734285A JPS62144742A (ja) | 1985-12-20 | 1985-12-20 | 真空処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62144742A true JPS62144742A (ja) | 1987-06-27 |
JPH0480733B2 JPH0480733B2 (enrdf_load_stackoverflow) | 1992-12-21 |
Family
ID=17716129
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP28734285A Granted JPS62144742A (ja) | 1985-12-20 | 1985-12-20 | 真空処理装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62144742A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04313038A (ja) * | 1991-04-08 | 1992-11-05 | Mitsubishi Electric Corp | ガス漏れ量検出装置 |
-
1985
- 1985-12-20 JP JP28734285A patent/JPS62144742A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04313038A (ja) * | 1991-04-08 | 1992-11-05 | Mitsubishi Electric Corp | ガス漏れ量検出装置 |
Also Published As
Publication number | Publication date |
---|---|
JPH0480733B2 (enrdf_load_stackoverflow) | 1992-12-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |