JPH0478981B2 - - Google Patents
Info
- Publication number
- JPH0478981B2 JPH0478981B2 JP16233987A JP16233987A JPH0478981B2 JP H0478981 B2 JPH0478981 B2 JP H0478981B2 JP 16233987 A JP16233987 A JP 16233987A JP 16233987 A JP16233987 A JP 16233987A JP H0478981 B2 JPH0478981 B2 JP H0478981B2
- Authority
- JP
- Japan
- Prior art keywords
- resist film
- light
- jig
- resist
- photoresist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229920002120 photoresistant polymer Polymers 0.000 claims description 22
- 239000000758 substrate Substances 0.000 claims description 17
- 238000004090 dissolution Methods 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 6
- 238000012544 monitoring process Methods 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims 2
- 238000011161 development Methods 0.000 description 12
- 238000005259 measurement Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 238000004377 microelectronic Methods 0.000 description 2
- 230000010349 pulsation Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16233987A JPS649449A (en) | 1987-07-01 | 1987-07-01 | Method and device for measuring photoresist characteristic |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16233987A JPS649449A (en) | 1987-07-01 | 1987-07-01 | Method and device for measuring photoresist characteristic |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS649449A JPS649449A (en) | 1989-01-12 |
| JPH0478981B2 true JPH0478981B2 (enExample) | 1992-12-14 |
Family
ID=15752676
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16233987A Granted JPS649449A (en) | 1987-07-01 | 1987-07-01 | Method and device for measuring photoresist characteristic |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS649449A (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5058875B2 (ja) * | 2008-05-12 | 2012-10-24 | Ｈｏｙａ株式会社 | マスクブランク、マスクブランクの製造方法、評価方法、および感度評価装置 |
| JP5373498B2 (ja) * | 2009-07-27 | 2013-12-18 | 芝浦メカトロニクス株式会社 | 基板の処理装置及び処理方法 |
| KR102138622B1 (ko) * | 2017-11-28 | 2020-07-28 | 주식회사 고영테크놀러지 | 기판 검사 장치 및 기판 검사 방법 |
| EP3489619B1 (en) | 2017-11-28 | 2025-08-13 | Koh Young Technology Inc. | Apparatus for inspecting substrate and method thereof |
| US10852125B2 (en) | 2017-11-28 | 2020-12-01 | Koh Young Technology Inc. | Apparatus for inspecting film on substrate by using optical interference and method thereof |
-
1987
- 1987-07-01 JP JP16233987A patent/JPS649449A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS649449A (en) | 1989-01-12 |
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