JPS649449A - Method and device for measuring photoresist characteristic - Google Patents

Method and device for measuring photoresist characteristic

Info

Publication number
JPS649449A
JPS649449A JP16233987A JP16233987A JPS649449A JP S649449 A JPS649449 A JP S649449A JP 16233987 A JP16233987 A JP 16233987A JP 16233987 A JP16233987 A JP 16233987A JP S649449 A JPS649449 A JP S649449A
Authority
JP
Japan
Prior art keywords
film
soln
resist
light
dropping
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16233987A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0478981B2 (enExample
Inventor
Tetsuo Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP16233987A priority Critical patent/JPS649449A/ja
Publication of JPS649449A publication Critical patent/JPS649449A/ja
Publication of JPH0478981B2 publication Critical patent/JPH0478981B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
JP16233987A 1987-07-01 1987-07-01 Method and device for measuring photoresist characteristic Granted JPS649449A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16233987A JPS649449A (en) 1987-07-01 1987-07-01 Method and device for measuring photoresist characteristic

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16233987A JPS649449A (en) 1987-07-01 1987-07-01 Method and device for measuring photoresist characteristic

Publications (2)

Publication Number Publication Date
JPS649449A true JPS649449A (en) 1989-01-12
JPH0478981B2 JPH0478981B2 (enExample) 1992-12-14

Family

ID=15752676

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16233987A Granted JPS649449A (en) 1987-07-01 1987-07-01 Method and device for measuring photoresist characteristic

Country Status (1)

Country Link
JP (1) JPS649449A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009271473A (ja) * 2008-05-12 2009-11-19 Hoya Corp マスクブランクおよびマスクブランクの製造方法
JP2011029455A (ja) * 2009-07-27 2011-02-10 Shibaura Mechatronics Corp 基板の処理装置及び処理方法
US20190162522A1 (en) 2017-11-28 2019-05-30 Koh Young Technology Inc. Apparatus for inspecting substrate and method thereof
JP2019101038A (ja) * 2017-11-28 2019-06-24 コー・ヤング・テクノロジー・インコーポレーテッド 基板検査装置及び基板検査方法
US10852125B2 (en) 2017-11-28 2020-12-01 Koh Young Technology Inc. Apparatus for inspecting film on substrate by using optical interference and method thereof

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009271473A (ja) * 2008-05-12 2009-11-19 Hoya Corp マスクブランクおよびマスクブランクの製造方法
JP2011029455A (ja) * 2009-07-27 2011-02-10 Shibaura Mechatronics Corp 基板の処理装置及び処理方法
US20190162522A1 (en) 2017-11-28 2019-05-30 Koh Young Technology Inc. Apparatus for inspecting substrate and method thereof
JP2019101038A (ja) * 2017-11-28 2019-06-24 コー・ヤング・テクノロジー・インコーポレーテッド 基板検査装置及び基板検査方法
JP2019101037A (ja) * 2017-11-28 2019-06-24 コー・ヤング・テクノロジー・インコーポレーテッド 基板検査装置及び基板検査方法
JP2020173269A (ja) * 2017-11-28 2020-10-22 コー・ヤング・テクノロジー・インコーポレーテッド 基板検査装置及び基板検査方法
US10852125B2 (en) 2017-11-28 2020-12-01 Koh Young Technology Inc. Apparatus for inspecting film on substrate by using optical interference and method thereof
US10859371B2 (en) 2017-11-28 2020-12-08 Koh Young Technology Inc. Apparatus for inspecting substrate and method thereof
US11543238B2 (en) 2017-11-28 2023-01-03 Koh Young Technology Inc. Apparatus for inspecting substrate and method thereof

Also Published As

Publication number Publication date
JPH0478981B2 (enExample) 1992-12-14

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