JPH0469935B2 - - Google Patents

Info

Publication number
JPH0469935B2
JPH0469935B2 JP61139449A JP13944986A JPH0469935B2 JP H0469935 B2 JPH0469935 B2 JP H0469935B2 JP 61139449 A JP61139449 A JP 61139449A JP 13944986 A JP13944986 A JP 13944986A JP H0469935 B2 JPH0469935 B2 JP H0469935B2
Authority
JP
Japan
Prior art keywords
photosensitive resin
resin composition
vinyl copolymer
average molecular
molecular weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61139449A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62295046A (ja
Inventor
Hideo Nakasaki
Kazutaka Masaoka
Hidetaka Itaya
Masumi Hirai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP13944986A priority Critical patent/JPS62295046A/ja
Publication of JPS62295046A publication Critical patent/JPS62295046A/ja
Publication of JPH0469935B2 publication Critical patent/JPH0469935B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP13944986A 1986-06-16 1986-06-16 感光性樹脂組成物 Granted JPS62295046A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13944986A JPS62295046A (ja) 1986-06-16 1986-06-16 感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13944986A JPS62295046A (ja) 1986-06-16 1986-06-16 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS62295046A JPS62295046A (ja) 1987-12-22
JPH0469935B2 true JPH0469935B2 (enExample) 1992-11-09

Family

ID=15245463

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13944986A Granted JPS62295046A (ja) 1986-06-16 1986-06-16 感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS62295046A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4655726B2 (ja) * 2005-04-01 2011-03-23 Ｊｓｒ株式会社 ネガ型感放射線性樹脂組成物

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE883410A (fr) * 1979-06-15 1980-11-21 Du Pont Film de photoresist pouvant etre developpe par un solvant
JPS5893046A (ja) * 1981-11-28 1983-06-02 Hitachi Chem Co Ltd 感光性エレメント
JPS5876827A (ja) * 1981-10-30 1983-05-10 Hitachi Chem Co Ltd 感光性樹脂組成物
JPS58102230A (ja) * 1981-12-15 1983-06-17 Hitachi Chem Co Ltd 感光性樹脂組成物
JPS6051833A (ja) * 1983-07-01 1985-03-23 Toray Ind Inc 感光性樹脂組成物
JPH0614185B2 (ja) * 1984-04-02 1994-02-23 日立化成工業株式会社 感光性樹脂組成物及びこれを用いた積層体
JPS60252341A (ja) * 1984-05-29 1985-12-13 Chisso Corp 感光性樹脂組成物

Also Published As

Publication number Publication date
JPS62295046A (ja) 1987-12-22

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