JPS62295046A - 感光性樹脂組成物 - Google Patents

感光性樹脂組成物

Info

Publication number
JPS62295046A
JPS62295046A JP13944986A JP13944986A JPS62295046A JP S62295046 A JPS62295046 A JP S62295046A JP 13944986 A JP13944986 A JP 13944986A JP 13944986 A JP13944986 A JP 13944986A JP S62295046 A JPS62295046 A JP S62295046A
Authority
JP
Japan
Prior art keywords
resin composition
photosensitive resin
weight average
sensitizer
vinyl copolymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13944986A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0469935B2 (enExample
Inventor
Hideo Nakasaki
中崎 日出夫
Kazutaka Masaoka
正岡 和隆
Hidetaka Itaya
英貴 板谷
Masumi Hirai
平井 ますみ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP13944986A priority Critical patent/JPS62295046A/ja
Publication of JPS62295046A publication Critical patent/JPS62295046A/ja
Publication of JPH0469935B2 publication Critical patent/JPH0469935B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP13944986A 1986-06-16 1986-06-16 感光性樹脂組成物 Granted JPS62295046A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13944986A JPS62295046A (ja) 1986-06-16 1986-06-16 感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13944986A JPS62295046A (ja) 1986-06-16 1986-06-16 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS62295046A true JPS62295046A (ja) 1987-12-22
JPH0469935B2 JPH0469935B2 (enExample) 1992-11-09

Family

ID=15245463

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13944986A Granted JPS62295046A (ja) 1986-06-16 1986-06-16 感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS62295046A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006285035A (ja) * 2005-04-01 2006-10-19 Jsr Corp ネガ型感放射線性樹脂組成物

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5625732A (en) * 1979-06-15 1981-03-12 Du Pont Improved photoresist film
JPS5876827A (ja) * 1981-10-30 1983-05-10 Hitachi Chem Co Ltd 感光性樹脂組成物
JPS5893046A (ja) * 1981-11-28 1983-06-02 Hitachi Chem Co Ltd 感光性エレメント
JPS58102230A (ja) * 1981-12-15 1983-06-17 Hitachi Chem Co Ltd 感光性樹脂組成物
JPS6051833A (ja) * 1983-07-01 1985-03-23 Toray Ind Inc 感光性樹脂組成物
JPS60208748A (ja) * 1984-04-02 1985-10-21 Hitachi Chem Co Ltd 感光性樹脂組成物及びこれを用いた積層体
JPS60252341A (ja) * 1984-05-29 1985-12-13 Chisso Corp 感光性樹脂組成物

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5625732A (en) * 1979-06-15 1981-03-12 Du Pont Improved photoresist film
JPS5876827A (ja) * 1981-10-30 1983-05-10 Hitachi Chem Co Ltd 感光性樹脂組成物
JPS5893046A (ja) * 1981-11-28 1983-06-02 Hitachi Chem Co Ltd 感光性エレメント
JPS58102230A (ja) * 1981-12-15 1983-06-17 Hitachi Chem Co Ltd 感光性樹脂組成物
JPS6051833A (ja) * 1983-07-01 1985-03-23 Toray Ind Inc 感光性樹脂組成物
JPS60208748A (ja) * 1984-04-02 1985-10-21 Hitachi Chem Co Ltd 感光性樹脂組成物及びこれを用いた積層体
JPS60252341A (ja) * 1984-05-29 1985-12-13 Chisso Corp 感光性樹脂組成物

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006285035A (ja) * 2005-04-01 2006-10-19 Jsr Corp ネガ型感放射線性樹脂組成物

Also Published As

Publication number Publication date
JPH0469935B2 (enExample) 1992-11-09

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