JPH0469643B2 - - Google Patents

Info

Publication number
JPH0469643B2
JPH0469643B2 JP60249811A JP24981185A JPH0469643B2 JP H0469643 B2 JPH0469643 B2 JP H0469643B2 JP 60249811 A JP60249811 A JP 60249811A JP 24981185 A JP24981185 A JP 24981185A JP H0469643 B2 JPH0469643 B2 JP H0469643B2
Authority
JP
Japan
Prior art keywords
substrate
thin film
organic
organic thin
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60249811A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62109803A (ja
Inventor
Hideo Takahashi
Koichi Iwata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP24981185A priority Critical patent/JPS62109803A/ja
Publication of JPS62109803A publication Critical patent/JPS62109803A/ja
Publication of JPH0469643B2 publication Critical patent/JPH0469643B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Polymerisation Methods In General (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
JP24981185A 1985-11-06 1985-11-06 有機薄膜形成方法 Granted JPS62109803A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24981185A JPS62109803A (ja) 1985-11-06 1985-11-06 有機薄膜形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24981185A JPS62109803A (ja) 1985-11-06 1985-11-06 有機薄膜形成方法

Publications (2)

Publication Number Publication Date
JPS62109803A JPS62109803A (ja) 1987-05-21
JPH0469643B2 true JPH0469643B2 (enExample) 1992-11-06

Family

ID=17198555

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24981185A Granted JPS62109803A (ja) 1985-11-06 1985-11-06 有機薄膜形成方法

Country Status (1)

Country Link
JP (1) JPS62109803A (enExample)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59164304A (ja) * 1983-03-07 1984-09-17 Mitsubishi Electric Corp 高分子重合膜形成装置
JPS6047003A (ja) * 1983-08-26 1985-03-14 Res Dev Corp Of Japan プラズマ重合法及びその重合装置

Also Published As

Publication number Publication date
JPS62109803A (ja) 1987-05-21

Similar Documents

Publication Publication Date Title
JP3560914B2 (ja) 低蒸気圧化合物を用いたプラズマ加速化学蒸着
EP1144131B1 (en) Plasma enhanced chemical deposition of conjugated polymer
US4085248A (en) Method to apply a protective layer to the surface of optical reflectors, and so-made reflectors, particularly automotive vehicle head lamps
US6217947B1 (en) Plasma enhanced polymer deposition onto fixtures
KR20010089583A (ko) 발광 중합체 복합 물질의 제조방법
KR20010089582A (ko) 마이크로텍스쳐화 표면의 상사 피복
CN1238792A (zh) 丙烯酸酯涂布方法
KR20010093843A (ko) 비선형 광학 중합체의 제조방법
JP2001329083A (ja) プラズマ処理を受けさせた材料
JP2001190948A (ja) 表面をプラズマ処理する方法及び装置
KR20030056328A (ko) 어븀이 도핑된 실리콘 나노 점 어레이 제조 방법 및 이에이용되는 레이저 기화 증착 장비
JPH0469643B2 (enExample)
JPS5874701A (ja) 高分子薄膜の形成方法
JPH0368886B2 (enExample)
JPS6350463A (ja) イオンプレ−テイング方法とその装置
JPH0472586B2 (enExample)
JPS63278934A (ja) ポリイミド薄膜の製造方法
JPS63282254A (ja) 弗素樹脂薄膜の製造方法
Affinito et al. A New Hybrid Deposition Process, Combining PML and PECVD, for High Rate Plasma Polymerization of Low Vapor Pressure, and Solid, Monomer Precursors
Usui et al. Synthesis of TPD-containing polymer thin films by physical vapor deposition
JPH01242177A (ja) ワイヤー被覆方法
KR980009406A (ko) 폴리올레핀계 수지의 접착력 증대방법
MXPA00003090A (en) Plasma enhanced chemical deposition with low vapor pressure compounds