JPS62109803A - 有機薄膜形成方法 - Google Patents
有機薄膜形成方法Info
- Publication number
- JPS62109803A JPS62109803A JP24981185A JP24981185A JPS62109803A JP S62109803 A JPS62109803 A JP S62109803A JP 24981185 A JP24981185 A JP 24981185A JP 24981185 A JP24981185 A JP 24981185A JP S62109803 A JPS62109803 A JP S62109803A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- organic thin
- substrate
- film formation
- formation method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 title claims description 17
- 238000000034 method Methods 0.000 title claims description 15
- 230000015572 biosynthetic process Effects 0.000 title description 4
- 239000000758 substrate Substances 0.000 claims description 16
- 239000000126 substance Substances 0.000 claims description 13
- 238000006116 polymerization reaction Methods 0.000 claims description 6
- 230000005684 electric field Effects 0.000 claims description 4
- 230000005855 radiation Effects 0.000 claims description 4
- 239000002994 raw material Substances 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 238000002844 melting Methods 0.000 claims description 3
- 239000002245 particle Substances 0.000 claims description 3
- 230000008018 melting Effects 0.000 claims description 2
- 239000010408 film Substances 0.000 description 10
- 239000004698 Polyethylene Substances 0.000 description 5
- -1 polyethylene Polymers 0.000 description 5
- 229920000573 polyethylene Polymers 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 238000003795 desorption Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 150000001793 charged compounds Chemical class 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000000752 ionisation method Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 238000001819 mass spectrum Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Polymerisation Methods In General (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24981185A JPS62109803A (ja) | 1985-11-06 | 1985-11-06 | 有機薄膜形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24981185A JPS62109803A (ja) | 1985-11-06 | 1985-11-06 | 有機薄膜形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62109803A true JPS62109803A (ja) | 1987-05-21 |
| JPH0469643B2 JPH0469643B2 (enExample) | 1992-11-06 |
Family
ID=17198555
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24981185A Granted JPS62109803A (ja) | 1985-11-06 | 1985-11-06 | 有機薄膜形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62109803A (enExample) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59164304A (ja) * | 1983-03-07 | 1984-09-17 | Mitsubishi Electric Corp | 高分子重合膜形成装置 |
| JPS6047003A (ja) * | 1983-08-26 | 1985-03-14 | Res Dev Corp Of Japan | プラズマ重合法及びその重合装置 |
-
1985
- 1985-11-06 JP JP24981185A patent/JPS62109803A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59164304A (ja) * | 1983-03-07 | 1984-09-17 | Mitsubishi Electric Corp | 高分子重合膜形成装置 |
| JPS6047003A (ja) * | 1983-08-26 | 1985-03-14 | Res Dev Corp Of Japan | プラズマ重合法及びその重合装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0469643B2 (enExample) | 1992-11-06 |
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