JPH0466500B2 - - Google Patents

Info

Publication number
JPH0466500B2
JPH0466500B2 JP11301086A JP11301086A JPH0466500B2 JP H0466500 B2 JPH0466500 B2 JP H0466500B2 JP 11301086 A JP11301086 A JP 11301086A JP 11301086 A JP11301086 A JP 11301086A JP H0466500 B2 JPH0466500 B2 JP H0466500B2
Authority
JP
Japan
Prior art keywords
mask
ultrapure water
cleaning
ice particles
dust
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP11301086A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62267742A (ja
Inventor
Yasuna Nakamura
Toshiaki Oomori
Hayaaki Fukumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP61113010A priority Critical patent/JPS62267742A/ja
Publication of JPS62267742A publication Critical patent/JPS62267742A/ja
Publication of JPH0466500B2 publication Critical patent/JPH0466500B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP61113010A 1986-05-15 1986-05-15 半導体製造方法 Granted JPS62267742A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61113010A JPS62267742A (ja) 1986-05-15 1986-05-15 半導体製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61113010A JPS62267742A (ja) 1986-05-15 1986-05-15 半導体製造方法

Publications (2)

Publication Number Publication Date
JPS62267742A JPS62267742A (ja) 1987-11-20
JPH0466500B2 true JPH0466500B2 (enExample) 1992-10-23

Family

ID=14601174

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61113010A Granted JPS62267742A (ja) 1986-05-15 1986-05-15 半導体製造方法

Country Status (1)

Country Link
JP (1) JPS62267742A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01207182A (ja) * 1988-02-15 1989-08-21 Taiyo Sanso Co Ltd 基板表面の洗浄装置
JPH02270322A (ja) * 1989-04-11 1990-11-05 Taiyo Sanso Co Ltd 半導体ウェハの洗浄装置
JP2908895B2 (ja) * 1991-03-18 1999-06-21 大陽東洋酸素株式会社 表面処理装置
TWI296131B (en) 2004-09-13 2008-04-21 Dainippon Screen Mfg Method and apparatus for treating a substrate

Also Published As

Publication number Publication date
JPS62267742A (ja) 1987-11-20

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